Issued Patents All Time
Showing 351–375 of 432 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7819980 | System and method for removing particles in semiconductor manufacturing | Chen-Yuan Hsia, Chang-Cheng Hung, Chi-Lun Lu, Shih-Ming Chang, Wen-Chuan Wang +2 more | 2010-10-26 |
| 7767984 | Resist collapse prevention using immersed hardening | Burn Jeng Lin | 2010-08-03 |
| 7759253 | Method and material for forming a double exposure lithography pattern | — | 2010-07-20 |
| 7732123 | Immersion photolithography with megasonic rinse | — | 2010-06-08 |
| 7718348 | Photolithography process and photomask structure implemented in a photolithography process | — | 2010-05-18 |
| 7691559 | Immersion lithography edge bead removal | C. C. Ke, Vincent Yu | 2010-04-06 |
| 7675588 | System for displaying images including a liquid crystal display panel | Chi-Mo Ko, Chao-Yin Lin, Li-Sen Chuang, Chia-Ching Chu | 2010-03-09 |
| 7675604 | Hood for immersion lithography | Li-Jui Chen, Tzung-Chi Fu, Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen +1 more | 2010-03-09 |
| 7642184 | Method for dual damascene process | Jen-Chieh Shih | 2010-01-05 |
| 7611825 | Photolithography method to prevent photoresist pattern collapse | Kuei-Shun Chen, Bang-Ching Ho | 2009-11-03 |
| 7579121 | Optical proximity correction photomasks | — | 2009-08-25 |
| 7566525 | Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication | Chin-Hsiang Lin | 2009-07-28 |
| 7531296 | Method of forming high etch resistant resist patterns | Chin-Hsiang Lin | 2009-05-12 |
| 7482280 | Method for forming a lithography pattern | Chin-Hsiang Lin, Burn Jeng Lin | 2009-01-27 |
| 7473517 | Supercritical developing for a lithographic process | Burn Jeng Lin, Chi-Wen Liu | 2009-01-06 |
| 7462248 | Method and system for cleaning a photomask | Chih-Cheng Chiu | 2008-12-09 |
| 7459798 | Overlay mark | — | 2008-12-02 |
| 7435512 | Photolithography process and photomask structure implemented in a photolithography process | — | 2008-10-14 |
| 7420188 | Exposure method and apparatus for immersion lithography | Chin-Hsiang Lin, Burn Jeng Lin, David Lu | 2008-09-02 |
| 7384726 | Resist collapse prevention using immersed hardening | Burn Jeng Lin | 2008-06-10 |
| 7371671 | System and method for photolithography in semiconductor manufacturing | Chin-Hsiang Lin, Burn Jeng Lin | 2008-05-13 |
| 7323393 | Method of reducing film stress on overlay mark | Yu-Lin Yen | 2008-01-29 |
| 7252911 | ESD-resistant photomask and method of preventing mask ESD damage | — | 2007-08-07 |
| 7224427 | Megasonic immersion lithography exposure apparatus and method | Chien-Hung Lin, Chin-Hsiang Lin, David Lu, Horng-Huei Tseng, Burn Jeng Lin | 2007-05-29 |
| 7196429 | Method of reducing film stress on overlay mark | Yu-Lin Yen | 2007-03-27 |