Issued Patents All Time
Showing 101–125 of 432 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11387104 | Grafting design for pattern post-treatment in semiconductor manufacturing | Siao-Shan Wang, Chin-Hsiang Lin | 2022-07-12 |
| 11378884 | Extreme ultraviolet photoresist and method | Chen-Yu Liu, Ya-Ching Chang, Cheng-Han Wu, Chin-Hsiang Lin | 2022-07-05 |
| 11361943 | Adjustable fastening device for plasma gas injectors | Yung-Shun Hsu, Chiao-Kai Chang, Wai Hong Cheah, Chien-Fang Lin | 2022-06-14 |
| 11355318 | Adjustable fastening device for plasma gas injectors | Yung-Shun Hsu, Chiao-Kai Chang, Wai Hong Cheah, Chien-Fang Lin | 2022-06-07 |
| 11351509 | Filter with seal treatment | Kuan-Hsin Lo | 2022-06-07 |
| 11320738 | Pattern formation method and material for manufacturing semiconductor devices | Chien-Wei Wang, Shang-Wern Chang, Yen-Hao Chen | 2022-05-03 |
| 11307504 | Humidity control in EUV lithography | An-Ren Zi, Chin-Hsiang Lin, Joy Cheng | 2022-04-19 |
| 11300878 | Photoresist developer and method of developing photoresist | An-Ren Zi, Chin-Hsiang Lin, Joy Cheng | 2022-04-12 |
| 11295961 | Method of manufacturing a semiconductor device | Yen-Hao Chen, Wei-Han Lai, Chin-Hsiang Lin | 2022-04-05 |
| 11287740 | Photoresist composition and method of forming photoresist pattern | An-Ren Zi, Chin-Hsiang Lin | 2022-03-29 |
| 11281107 | Method for performing lithography process with post treatment | Ming-Hui Weng, Chin-Hsiang Lin | 2022-03-22 |
| 11276568 | Method for manufacturing a semiconductor device and a coating material | Yu Ling Chien, Chien-Chih Chen, Chin-Hsiang Lin, Yahru Cheng | 2022-03-15 |
| 11269256 | Underlayer material for photoresist | An-Ren Zi, Wei-Han Lai | 2022-03-08 |
| 11262659 | Method of cleaning extreme ultraviolet lithography collector | An-Ren Zi, Chin-Hsiang Lin | 2022-03-01 |
| 11226555 | Preparing patterned neutral layers and structures prepared using the same | Kuan-Hsin Lo | 2022-01-18 |
| 11215924 | Photoresist, developer, and method of forming photoresist pattern | An-Ren Zi, Chin-Hsiang Lin | 2022-01-04 |
| 11158509 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Chih-Yuan Ting +7 more | 2021-10-26 |
| 11143963 | Negative tone developer for extreme ultraviolet lithography | Chen-Yu Liu, Wei-Han Lai, Tzu-Yang Lin, Ming-Hui Weng, Chin-Hsiang Lin | 2021-10-12 |
| 11137685 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Joy Cheng, Chin-Hsiang Lin | 2021-10-05 |
| 11127592 | Photosensitive groups in resist layer | Ya-Ching Chang, Chin-Hsiang Lin, Yen-Hao Chen | 2021-09-21 |
| 11112698 | Photoresist with gradient composition for improved uniformity | Chang Lilin, Chin-Hsiang Lin | 2021-09-07 |
| 11106138 | Lithography process and material for negative tone development | Chien-Wei Wang, Wei-Han Lai | 2021-08-31 |
| 11094541 | Anti-reflective coating materials | Yu-Chung Su | 2021-08-17 |
| 11079681 | Lithography method for positive tone development | Ming-Hui Weng, Chen-Yu Liu, Cheng-Han Wu, Chin-Hsiang Lin | 2021-08-03 |
| 11073763 | Photoresist and method | Wei-Han Lai, Chen-Hau Wu | 2021-07-27 |