Issued Patents All Time
Showing 26–50 of 432 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12210286 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Joy Cheng | 2025-01-28 |
| 12189293 | Method of manufacturing a semiconductor device | Chieh Hsieh, Wei-Han Lai | 2025-01-07 |
| 12189287 | Photoresist composition and method of forming photoresist pattern | Li-Po YANG, Wei-Han Lai | 2025-01-07 |
| 12189296 | Lithography process and material for negative tone development | Chien-Wei Wang, Wei-Han Lai | 2025-01-07 |
| 12181798 | Extreme ultraviolet photolithography method with developer composition | An-Ren Zi, Joy Cheng, Chin-Hsiang Lin | 2024-12-31 |
| 12174540 | Method of manufacturing a semiconductor device | An-Ren Zi | 2024-12-24 |
| 12159787 | Method of manufacturing a semiconductor device and pattern formation method | Chih-Cheng Liu, Ming-Hui Weng, Jr-Hung Li, Yahru Cheng, Chi-Ming Yang +1 more | 2024-12-03 |
| 12148610 | Spin on carbon composition and method of manufacturing a semiconductor device | Jing Hong Huang, Wei-Han Lai | 2024-11-19 |
| 12135502 | Resin, photoresist composition, and method of manufacturing semiconductor device | Siao-Shan Wang, Chin-Hsiang Lin | 2024-11-05 |
| 12135501 | Method of manufacturing a semiconductor device | Ming-Hui Weng, Chen-Yu Liu, Chih-Cheng Liu, Yi-Chen Kuo, Jia-Lin WEI +5 more | 2024-11-05 |
| 12134690 | Photoresist composition and method of manufacturing a semiconductor device | Yen-Hao Chen, Wei-Han Lai | 2024-11-05 |
| 12106961 | Humidity control or aqueous treatment for EUV metallic resist | An-Ren Zi, Yahru Cheng, Chin-Hsiang Lin | 2024-10-01 |
| 12087644 | Methods of determining process recipes and forming a semiconductor device | Jung-Hau Shiu, Jei-Ming Chen, Jr-Yu Chen, Tze-Liang Lee | 2024-09-10 |
| 12087616 | Air gap formation method | Chun-Chih HO, Yu-Chung Su, Chin-Hsiang Lin | 2024-09-10 |
| 12085855 | Resin, photoresist composition, and method of manufacturing semiconductor device | Siao-Shan Wang, Chin-Hsiang Lin | 2024-09-10 |
| 12074058 | Patterning methods for semiconductor devices | Wei-Ren Wang, Shing-Chyang Pan, Wan-Lin Tsai, Jung-Hau Shiu, Tze-Liang Lee | 2024-08-27 |
| 12074027 | Underlayer of multilayer structure and methods of use thereof | Jing Hong Huang, Wei-Han Lai | 2024-08-27 |
| 12074025 | Photoresist developer and method of developing photoresist | Ming-Hui Weng, An-Ren Zi, Chen-Yu Liu | 2024-08-27 |
| 12057315 | Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern | Yi-Chen Kuo, Chih-Cheng Liu, Ming-Hui Weng, Jia-Lin WEI, Yen-Yu Chen +4 more | 2024-08-06 |
| 12050404 | Photoresist with polar-acid-labile-group | An-Ren Zi | 2024-07-30 |
| 12025920 | Lithography techniques for reducing defects | Ming-Hui Weng | 2024-07-02 |
| 12019375 | Photosensitive material and method of lithography | An-Ren Zi, Chien-Wei Wang | 2024-06-25 |
| 12009210 | Method of manufacturing a semiconductor device | An-Ren Zi, Chin-Hsiang Lin | 2024-06-11 |
| 12002710 | Semiconductor structure and methods of forming the same | Yu-Hsin Chan, Jiing-Feng Yang, Kuan-Wei Huang, Meng-Shu Lin, Yu-Yu Chen +3 more | 2024-06-04 |
| 11984316 | Porogen bonded gap filling material in semiconductor manufacturing | Bo-Jiun Lin, Hai-Ching Chen, Tien-I Bao | 2024-05-14 |