Issued Patents All Time
Showing 51–75 of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5736292 | Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups | Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Ryotaro Hanawa | 1998-04-07 |
| 5714620 | Polyhydric phenol compound and positive resist composition comprising the same | Jun Tomioka, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida | 1998-02-03 |
| 5587492 | Polyhydric phenol compound and positive resist composition comprising the same | Jun Tomioka, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida | 1996-12-24 |
| 5468590 | Positive resist composition | Kazuhiko Hashimoto, Haruyoshi Osaki, Chinehito Ebina, Kyoko Nagase, Hiroshi Moriuma | 1995-11-21 |
| 5456996 | Radiation-sensitive positive resist composition | Haruyoshi Ozaki, Fumio Oi, Makoto Hanabata, Takeshi Hioki | 1995-10-10 |
| 5456995 | Radiation-sensitive positive resist composition | Haruyoshi Ozaki, Fumio Oi, Makoto Hanabata, Takeshi Hioki | 1995-10-10 |
| 5436107 | Positive resist composition | Jun Tomioka, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida | 1995-07-25 |
| 5424167 | Positive type quinonediazide resist composition containing alkali-soluble novolac resin and aromatic hydroxy compound additive | Hiroshi Moriuma | 1995-06-13 |
| 5413895 | Positive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound. | Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Ayako Ida | 1995-05-09 |
| 5407778 | Positive resist composition | Jun Tomioka, Hirotoshi Nakanishi | 1995-04-18 |
| 5407780 | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde | Takeshi Hioki, Seiko Kurio, Yasunori Doi, Hiroshi Moriuma | 1995-04-18 |
| 5407779 | Positive resist composition | Jun Tomioka, Hirotoshi Nakanishi | 1995-04-18 |
| 5403696 | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol | Takeshi Hioki, Seiko Kurio, Yasunori Doi | 1995-04-04 |
| 5395727 | Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol | Haruyoshi Osaki, Naoki Takeyama, Yuji Ueda, Hiromi Ueki, Takehiro Kusumoto | 1995-03-07 |
| 5378586 | Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester | Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Fumio Oi | 1995-01-03 |
| 5374742 | Positive resist composition | Hirotoshi Nakanishi | 1994-12-20 |
| 5362598 | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye | Naoki Takeyama, Hirotoshi Nakanishi, Ryotaro Hanawa | 1994-11-08 |
| 5336583 | Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone | Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki, Ryotaro Hanawa | 1994-08-09 |
| 5326665 | Positive type resist composition | Haruyoshi Osaki, Hiroshi Moriuma | 1994-07-05 |
| 5290656 | Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound | Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto, Fumio Oi +1 more | 1994-03-01 |
| 5290657 | Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound | Hirotoshi Nakanishi | 1994-03-01 |
| 5288587 | Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound | Haruyoshi Osaki | 1994-02-22 |
| 5283155 | Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative | Hirotoshi Nakanishi, Yasunori Doi | 1994-02-01 |
| 5283324 | Process for preparing radiation sensitive compound and positive resist composition | Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Hiroshi Takagaki, Yasunori Doi +1 more | 1994-02-01 |
| 5275910 | Positive radiation-sensitive resist composition | Hiroshi Moriuma, Hirotoshi Nakanishi | 1994-01-04 |