Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8088863 | Organic-solvent dispersion of fine polysilsesquioxane particle, process for producing the same, aqueous dispersion of fine polysilsesquioxane particle, and process for producing the same | Chenghuan Ma, Masamichi Yamamoto | 2012-01-03 |
| 7456321 | Process for producing high-purity 4,4′-dihydroxydiphenyl sulfone | Eiji Ogata, Norio Yanase, Nobuyuki Nate | 2008-11-25 |
| 6974886 | Process for producing dihydroxydiphenylsulfone | Norio Yanase, Takayuki Kitahara, Nobuyuki Nate | 2005-12-13 |
| 6965054 | Process for producing mixture of dihydroxydiphenylsulfone isomers | Norio Yanase, Masamichi Yamamoto | 2005-11-15 |
| 6861562 | Process for producing mixture of dihydroxydiphenylsulfone isomers | Norio Yanase, Hiroyuki Yamamoto | 2005-03-01 |
| 5861229 | Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound | Haruyoshi Osaki, Yasunori Uetani, Makoto Hanabata, Takeshi Hioki | 1999-01-19 |
| 5456995 | Radiation-sensitive positive resist composition | Haruyoshi Ozaki, Yasunori Uetani, Makoto Hanabata, Takeshi Hioki | 1995-10-10 |
| 5456996 | Radiation-sensitive positive resist composition | Haruyoshi Ozaki, Yasunori Uetani, Makoto Hanabata, Takeshi Hioki | 1995-10-10 |
| 5378586 | Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester | Yasunori Uetani, Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana | 1995-01-03 |
| 5290656 | Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound | Yasunori Uetani, Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto +1 more | 1994-03-01 |
| 5124228 | Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester | Yasunori Uetani, Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana | 1992-06-23 |
| 5080997 | Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture | Takeshi Hioki, Koji Kuwana, Jun Tomioka, Hirotoshi Nakanishi, Yasunori Uetani +1 more | 1992-01-14 |
| 5059507 | Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin | Yasunori Uetani, Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto | 1991-10-22 |
| 4812551 | Novolak resin for positive photoresist | Haruyoshi Osaki, Akihiro Furuta, Yukikazu Uemura, Takao Ninomiya, Yasunori Uetani +1 more | 1989-03-14 |