Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7264912 | Method of producing photoresist | Kota Tokuhara, Yukio Hanamoto | 2007-09-04 |
| 5861229 | Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound | Haruyoshi Osaki, Fumio Oi, Yasunori Uetani, Makoto Hanabata | 1999-01-19 |
| 5792585 | Radiation-sensitive positive resist composition | Ayako Ida, Haruyoshi Osaki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa | 1998-08-11 |
| 5783355 | Radiation-sensitive positive resist composition | Ayako Ida, Haruyoshi Osaki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa | 1998-07-21 |
| 5736292 | Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups | Ayako Ida, Haruyoshi Osaki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa | 1998-04-07 |
| 5456995 | Radiation-sensitive positive resist composition | Haruyoshi Ozaki, Fumio Oi, Yasunori Uetani, Makoto Hanabata | 1995-10-10 |
| 5456996 | Radiation-sensitive positive resist composition | Haruyoshi Ozaki, Fumio Oi, Yasunori Uetani, Makoto Hanabata | 1995-10-10 |
| 5407780 | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde | Seiko Kurio, Yasunori Uetani, Yasunori Doi, Hiroshi Moriuma | 1995-04-18 |
| 5403696 | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol | Seiko Kurio, Yasunori Uetani, Yasunori Doi | 1995-04-04 |
| 5354644 | Photoresist compositions comprising styryl compound | Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akihiro Furuta, Jun Tomioka | 1994-10-11 |
| 5220027 | Sulfone-containing azamethide compounds with a nitrogen-containing aromatic ring of nitrogen containing aliphatic | Kiyoteru Kojima, Jun Tomioka | 1993-06-15 |
| 5218136 | Styryl compounds, process for preparing the same and photoresist compositions comprising the same | Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akirhiro Furuta, Jun Tomioka | 1993-06-08 |
| 5198323 | Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component | Teijiro Kitao, Masaru Matsuoka, Ryotaro Hanawa, Yasunori Uetani, Naoki Takeyama +1 more | 1993-03-30 |
| 5188920 | Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound | Hiroshi Moriuma, Haruyoshi Osaki, Yasunori Uetani | 1993-02-23 |
| 5136054 | Sulfone-containing azamethine compounds | Kiyoteru Kojima, Jun Tomioka | 1992-08-04 |
| 5080997 | Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture | Koji Kuwana, Jun Tomioka, Hirotoshi Nakanishi, Yasunori Uetani, Yukio Hanamoto +1 more | 1992-01-14 |
| 5077264 | Cyan dye-donor element used in thermal transfer and thermal transfer sheet using it | Yoshiaki Hayashi, Taira Fujita, Takehiro Kusumoto | 1991-12-31 |
| 5061796 | Azamethine compounds | Kiyoteru Kojima, Jun Tomioka | 1991-10-29 |
| 5028708 | Azamethinyl quinoline derivatives | Kiyoteru Kojima, Jun Tomioka | 1991-07-02 |
| 4769494 | Process for producing O,O-di-lower-alkylchlorothiophosphate | Motomasa Ohsu, Koichi Kamemoto, Manabu Yahata, Tooru Tokumaru, Hiroshi Ueda | 1988-09-06 |