Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE40964 | Negative type resist composition | Masumi Suetsugu, Takehiro Kusumoto, Masanori Shinada | 2009-11-10 |
| 6656660 | Resist composition | Fumiyoshi Urano, Hirotoshi Fujie, Koji Ichikawa | 2003-12-02 |
| 6329119 | Negative type resist composition | Masumi Suetsugu, Takehiro Kusumoto, Masanori Shinada | 2001-12-11 |
| 6280902 | Positive working photoresist compositions comprising a nitrogen-containing cyclic compound | Yuko Yako | 2001-08-28 |
| 6156476 | Positive photoresist composition | Hiromi Ueki, Yuji Ueda, Takehiro Kusumoto, Yuko Nakano | 2000-12-05 |
| 5985511 | Photoresist composition | Yuko Yako, Kenji Takahashi | 1999-11-16 |
| 5965748 | Succinimide derivative, process for production and use thereof | Akira Kamabuchi, Jun Tomioka, Haruyoshi Osaki | 1999-10-12 |
| 5876895 | Photosensitive resin composition for color filter | Yoshiki Hishiro, Shigeki Yamamoto | 1999-03-02 |
| 5846688 | Photoresist composition | Nobuhito Fukui, Yuji Ueda, Takehiro Kusumoto, Yuko Yako, Shigeki Yamamoto | 1998-12-08 |
| 5800966 | Positive photoresist composition | Yuji Ueda, Hiromi Ueki, Takehiro Kusumoto | 1998-09-01 |
| 5731110 | Photoresist composition for use in color filters | Yoshiki Hishiro, Shigeki Yamamoto | 1998-03-24 |
| 5686585 | Azo dyes for use in color filters and method for production of color filters | Yoshiki Hishiro, Shigeki Yamamoto | 1997-11-11 |
| 5614594 | Curable resin composition for overcoat film of color filter and color filter | Susumu Miyazaki, Shigeaki Chika, Kouichi Satou, Shigeki Yamamoto | 1997-03-25 |
| 5585218 | Photoresist composition containing alkyletherified polyvinylphenol | Yuko Nakano, Yuji Ueda, Takehiro Kusumoto, Hiromi Oka | 1996-12-17 |
| 5478680 | Color filter | Yoshiki Hishiro, Shigeki Yamamoto | 1995-12-26 |
| 5420331 | Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same | Yuji Ueda, Hiromi Ueki, Takehiro Kusumoto | 1995-05-30 |
| 5397679 | Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same | Yuji Ueda, Hiromi Ueki, Takehiro Kusumoto | 1995-03-14 |
| 5395727 | Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol | Yasunori Uetani, Haruyoshi Osaki, Yuji Ueda, Hiromi Ueki, Takehiro Kusumoto | 1995-03-07 |
| 5362598 | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye | Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa | 1994-11-08 |
| 5304456 | Negative photoresist composition | Yuji Ueda, Hiromi Ueki, Takehiro Kusumoto | 1994-04-19 |
| 5198323 | Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component | Teijiro Kitao, Masaru Matsuoka, Ryotaro Hanawa, Yasunori Uetani, Takeshi Hioki +1 more | 1993-03-30 |