Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6156476 | Positive photoresist composition | Naoki Takeyama, Yuji Ueda, Takehiro Kusumoto, Yuko Nakano | 2000-12-05 |
| 6100374 | Method of purifying crude naphthalenedicarboxlic acid and process for preparing polyethylene naphthalate | Hiroshi Iwasaki, Satoshi Inoki | 2000-08-08 |
| 5811513 | Process for producing polyethylene naphthalate | Hiroshi Iwasaki, Masayasu Ishibashi, Shoji Hiraoka, Toru Matsuyoshi, Satoshi Inoki | 1998-09-22 |
| 5800966 | Positive photoresist composition | Yuji Ueda, Naoki Takeyama, Takehiro Kusumoto | 1998-09-01 |
| 5420331 | Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same | Yuji Ueda, Naoki Takeyama, Takehiro Kusumoto | 1995-05-30 |
| 5397679 | Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same | Yuji Ueda, Naoki Takeyama, Takehiro Kusumoto | 1995-03-14 |
| 5395727 | Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol | Yasunori Uetani, Haruyoshi Osaki, Naoki Takeyama, Yuji Ueda, Takehiro Kusumoto | 1995-03-07 |
| 5304456 | Negative photoresist composition | Yuji Ueda, Naoki Takeyama, Takehiro Kusumoto | 1994-04-19 |