Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6383708 | Positive resist composition | Yasunori Uetani, Yasunori Doi, Kazuhiko Hashimoto, Ryotaro Hanawa | 2002-05-07 |
| 5965748 | Succinimide derivative, process for production and use thereof | Akira Kamabuchi, Naoki Takeyama, Jun Tomioka | 1999-10-12 |
| 5866724 | Positive resist composition and photosensitizers | Koji Ichikawa, Hiroki Inoue | 1999-02-02 |
| 5861229 | Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound | Fumio Oi, Yasunori Uetani, Makoto Hanabata, Takeshi Hioki | 1999-01-19 |
| 5843616 | Positive resist composition | Kunishige Edamatsu, Yuji Yoshida, Kazuhiko Hashimoto | 1998-12-01 |
| 5807656 | Polyhydroxy compound and a positive photoresist containing the same | Koji Ichikawa, Yasunori Uetani, Yoshiyuki Takata | 1998-09-15 |
| 5792585 | Radiation-sensitive positive resist composition | Ayako Ida, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa | 1998-08-11 |
| 5792586 | Positive resist composition comprising a novolac resin made from a cycloalkyl substituted phenol | Kazuhiko Hashimoto, Yasunori Uetani | 1998-08-11 |
| 5783355 | Radiation-sensitive positive resist composition | Ayako Ida, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa | 1998-07-21 |
| 5736292 | Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups | Ayako Ida, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa | 1998-04-07 |
| 5726217 | Tetraphenol compounds and process for producing the same | Koji Ichikawa, Jun Tomioka | 1998-03-10 |
| 5468590 | Positive resist composition | Kazuhiko Hashimoto, Chinehito Ebina, Kyoko Nagase, Hiroshi Moriuma, Yasunori Uetani | 1995-11-21 |
| 5451484 | Positive resist composition | Kyoko Nagase, Hiroshi Moriuma | 1995-09-19 |
| 5429904 | Positive resist composition | Kyoko Nagase, Kazuhiko Hashimoto, Hiroshi Moriuma | 1995-07-04 |
| 5395727 | Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol | Yasunori Uetani, Naoki Takeyama, Yuji Ueda, Hiromi Ueki, Takehiro Kusumoto | 1995-03-07 |
| 5336583 | Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone | Yasunori Uetani, Yasunori Doi, Kazuhiko Hashimoto, Ryotaro Hanawa | 1994-08-09 |
| 5326665 | Positive type resist composition | Hiroshi Moriuma, Yasunori Uetani | 1994-07-05 |
| 5288587 | Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound | Yasunori Uetani | 1994-02-22 |
| 5188920 | Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound | Hiroshi Moriuma, Takeshi Hioki, Yasunori Uetani | 1993-02-23 |
| 4812551 | Novolak resin for positive photoresist | Fumio Oi, Akihiro Furuta, Yukikazu Uemura, Takao Ninomiya, Yasunori Uetani +1 more | 1989-03-14 |