Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6383708 | Positive resist composition | Yasunori Uetani, Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki | 2002-05-07 |
| 5792585 | Radiation-sensitive positive resist composition | Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani | 1998-08-11 |
| 5783355 | Radiation-sensitive positive resist composition | Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani | 1998-07-21 |
| 5736292 | Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups | Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani | 1998-04-07 |
| 5714620 | Polyhydric phenol compound and positive resist composition comprising the same | Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ayako Ida | 1998-02-03 |
| 5587492 | Polyhydric phenol compound and positive resist composition comprising the same | Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ayako Ida | 1996-12-24 |
| 5436107 | Positive resist composition | Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ayako Ida | 1995-07-25 |
| 5362598 | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye | Naoki Takeyama, Yasunori Uetani, Hirotoshi Nakanishi | 1994-11-08 |
| 5354644 | Photoresist compositions comprising styryl compound | Takanori Yamamoto, Shinji Konishi, Akihiro Furuta, Takeshi Hioki, Jun Tomioka | 1994-10-11 |
| 5336583 | Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone | Yasunori Uetani, Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki | 1994-08-09 |
| 5283324 | Process for preparing radiation sensitive compound and positive resist composition | Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Hiroshi Takagaki, Yasunori Doi +1 more | 1994-02-01 |
| 5218136 | Styryl compounds, process for preparing the same and photoresist compositions comprising the same | Takanori Yamamoto, Shinji Konishi, Akirhiro Furuta, Takeshi Hioki, Jun Tomioka | 1993-06-08 |
| 5198323 | Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component | Teijiro Kitao, Masaru Matsuoka, Yasunori Uetani, Naoki Takeyama, Takeshi Hioki +1 more | 1993-03-30 |