Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6040112 | Photoresist composition | Yuko Yako, Kenji Takahashi, Nobuhito Fukui | 2000-03-21 |
| 5916728 | Positive resist composition | Nobuhito Fukui, Yuko Yako, Kenji Takahashi | 1999-06-29 |
| 5891601 | Positive resist composition | Nobuhito Fukui, Yuko Yako, Kenji Takahashi | 1999-04-06 |
| 5368987 | Process for producing resist composition | Yukio Hanamoto, Ayako Ida | 1994-11-29 |
| 5360696 | Resist composition | Yukio Hanamoto, Ayako Ida | 1994-11-01 |
| 5283324 | Process for preparing radiation sensitive compound and positive resist composition | Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Yasunori Doi, Yasunori Uetani +1 more | 1994-02-01 |
| 5198323 | Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component | Teijiro Kitao, Masaru Matsuoka, Ryotaro Hanawa, Yasunori Uetani, Naoki Takeyama +1 more | 1993-03-30 |