JT

Jun Tomioka

SC Sumitomo Chemical: 20 patents #146 of 4,033Top 4%
📍 Ibaraki, JP: #397 of 6,779 inventorsTop 6%
Overall (All Time): #226,243 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
6383709 Positive resist composition comprising N-(n-octylsulfonyloxy) succinimide Yasunori Uetani, Sang Ho Lee 2002-05-07
6068962 Positive resist composition Yasunori Uetani, Hiroshi Moriuma 2000-05-30
5965748 Succinimide derivative, process for production and use thereof Akira Kamabuchi, Naoki Takeyama, Haruyoshi Osaki 1999-10-12
5726217 Tetraphenol compounds and process for producing the same Koji Ichikawa, Haruyoshi Osaki 1998-03-10
5714620 Polyhydric phenol compound and positive resist composition comprising the same Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida 1998-02-03
5587492 Polyhydric phenol compound and positive resist composition comprising the same Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida 1996-12-24
5556995 Process for the preparation of polyhydric phenol compounds Naoko Suzuki, Hirotoshi Nakanishi 1996-09-17
5436107 Positive resist composition Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida 1995-07-25
5413895 Positive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound. Koji Kuwana, Hirotoshi Nakanishi, Yasunori Uetani, Ayako Ida 1995-05-09
5407778 Positive resist composition Yasunori Uetani, Hirotoshi Nakanishi 1995-04-18
5407779 Positive resist composition Yasunori Uetani, Hirotoshi Nakanishi 1995-04-18
5354644 Photoresist compositions comprising styryl compound Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akihiro Furuta, Takeshi Hioki 1994-10-11
5290656 Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound Yasunori Uetani, Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto +1 more 1994-03-01
5283324 Process for preparing radiation sensitive compound and positive resist composition Koji Kuwana, Hirotoshi Nakanishi, Hiroshi Takagaki, Yasunori Doi, Yasunori Uetani +1 more 1994-02-01
5220027 Sulfone-containing azamethide compounds with a nitrogen-containing aromatic ring of nitrogen containing aliphatic Takeshi Hioki, Kiyoteru Kojima 1993-06-15
5218136 Styryl compounds, process for preparing the same and photoresist compositions comprising the same Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akirhiro Furuta, Takeshi Hioki 1993-06-08
5136054 Sulfone-containing azamethine compounds Takeshi Hioki, Kiyoteru Kojima 1992-08-04
5080997 Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture Takeshi Hioki, Koji Kuwana, Hirotoshi Nakanishi, Yasunori Uetani, Yukio Hanamoto +1 more 1992-01-14
5061796 Azamethine compounds Takeshi Hioki, Kiyoteru Kojima 1991-10-29
5028708 Azamethinyl quinoline derivatives Takeshi Hioki, Kiyoteru Kojima 1991-07-02