Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7135268 | Amplification type positive resist composition | Akira Kamabuchi, Yasunori Uetani | 2006-11-14 |
| 6951706 | Sulfonate and resist composition | Satoshi Yamaguchi, Yasunori Uetani | 2005-10-04 |
| 6835527 | Chemical amplifying type positive resist composition | Yoshiyuki Takata | 2004-12-28 |
| 6815140 | Positive resist composition | Yasunori Uetani, Yoshiyuki Takata | 2004-11-09 |
| 6767686 | Chemically amplifying type positive resist composition | Yasunori Uetani, Kenji Ohashi | 2004-07-27 |
| 6743885 | Resin composition for intermediate layer of three-layer resist | Isao Yahagi, Yasunori Uetani | 2004-06-01 |
| 6274287 | Positive resist compositions comprising a hydroxyphenyl ketone | Yoshiyuki Takata | 2001-08-14 |
| 6068962 | Positive resist composition | Yasunori Uetani, Jun Tomioka | 2000-05-30 |
| 5849457 | Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and .gamma. - | Katsuhiko Namba, Kaoru Tatekawa, Yasunori Uetani | 1998-12-15 |
| 5468590 | Positive resist composition | Kazuhiko Hashimoto, Haruyoshi Osaki, Chinehito Ebina, Kyoko Nagase, Yasunori Uetani | 1995-11-21 |
| 5451484 | Positive resist composition | Kyoko Nagase, Haruyoshi Osaki | 1995-09-19 |
| 5429904 | Positive resist composition | Kyoko Nagase, Haruyoshi Osaki, Kazuhiko Hashimoto | 1995-07-04 |
| 5424167 | Positive type quinonediazide resist composition containing alkali-soluble novolac resin and aromatic hydroxy compound additive | Yasunori Uetani | 1995-06-13 |
| 5407780 | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde | Takeshi Hioki, Seiko Kurio, Yasunori Uetani, Yasunori Doi | 1995-04-18 |
| 5326665 | Positive type resist composition | Haruyoshi Osaki, Yasunori Uetani | 1994-07-05 |
| 5275910 | Positive radiation-sensitive resist composition | Hirotoshi Nakanishi, Yasunori Uetani | 1994-01-04 |
| 5188920 | Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound | Haruyoshi Osaki, Takeshi Hioki, Yasunori Uetani | 1993-02-23 |