Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6383708 | Positive resist composition | Yasunori Uetani, Kazuhiko Hashimoto, Haruyoshi Osaki, Ryotaro Hanawa | 2002-05-07 |
| 5792585 | Radiation-sensitive positive resist composition | Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Uetani, Ryotaro Hanawa | 1998-08-11 |
| 5783355 | Radiation-sensitive positive resist composition | Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Uetani, Ryotaro Hanawa | 1998-07-21 |
| 5736292 | Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups | Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Uetani, Ryotaro Hanawa | 1998-04-07 |
| 5407780 | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde | Takeshi Hioki, Seiko Kurio, Yasunori Uetani, Hiroshi Moriuma | 1995-04-18 |
| 5403696 | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol | Takeshi Hioki, Seiko Kurio, Yasunori Uetani | 1995-04-04 |
| 5336583 | Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone | Yasunori Uetani, Kazuhiko Hashimoto, Haruyoshi Osaki, Ryotaro Hanawa | 1994-08-09 |
| 5283155 | Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative | Yasunori Uetani, Hirotoshi Nakanishi | 1994-02-01 |
| 5283324 | Process for preparing radiation sensitive compound and positive resist composition | Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Hiroshi Takagaki, Yasunori Uetani +1 more | 1994-02-01 |