Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7220532 | Chemical amplification type resist composition | Yoshiyuki Takata, Isao Yoshida | 2007-05-22 |
| 5714620 | Polyhydric phenol compound and positive resist composition comprising the same | Jun Tomioka, Yasunori Uetani, Ryotaro Hanawa, Ayako Ida | 1998-02-03 |
| 5591871 | Bislactone compound and a process for producing the same | Naoko Suzuki, Kyouko Nagase | 1997-01-07 |
| 5587492 | Polyhydric phenol compound and positive resist composition comprising the same | Jun Tomioka, Yasunori Uetani, Ryotaro Hanawa, Ayako Ida | 1996-12-24 |
| 5556995 | Process for the preparation of polyhydric phenol compounds | Naoko Suzuki, Jun Tomioka | 1996-09-17 |
| 5436107 | Positive resist composition | Jun Tomioka, Yasunori Uetani, Ryotaro Hanawa, Ayako Ida | 1995-07-25 |
| 5413895 | Positive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound. | Jun Tomioka, Koji Kuwana, Yasunori Uetani, Ayako Ida | 1995-05-09 |
| 5407779 | Positive resist composition | Yasunori Uetani, Jun Tomioka | 1995-04-18 |
| 5407778 | Positive resist composition | Yasunori Uetani, Jun Tomioka | 1995-04-18 |
| 5378586 | Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester | Yasunori Uetani, Makoto Hanabata, Koji Kuwana, Fumio Oi | 1995-01-03 |
| 5374742 | Positive resist composition | Yasunori Uetani | 1994-12-20 |
| 5362598 | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye | Naoki Takeyama, Yasunori Uetani, Ryotaro Hanawa | 1994-11-08 |
| 5290656 | Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound | Yasunori Uetani, Makoto Hanabata, Koji Kuwana, Yukio Hanamoto, Fumio Oi +1 more | 1994-03-01 |
| 5290657 | Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound | Yasunori Uetani | 1994-03-01 |
| 5283155 | Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative | Yasunori Uetani, Yasunori Doi | 1994-02-01 |
| 5283324 | Process for preparing radiation sensitive compound and positive resist composition | Jun Tomioka, Koji Kuwana, Hiroshi Takagaki, Yasunori Doi, Yasunori Uetani +1 more | 1994-02-01 |
| 5275910 | Positive radiation-sensitive resist composition | Hiroshi Moriuma, Yasunori Uetani | 1994-01-04 |
| 5124228 | Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester | Yasunori Uetani, Makoto Hanabata, Koji Kuwana, Fumio Oi | 1992-06-23 |
| 5080997 | Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture | Takeshi Hioki, Koji Kuwana, Jun Tomioka, Yasunori Uetani, Yukio Hanamoto +1 more | 1992-01-14 |
| 5059507 | Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin | Yasunori Uetani, Makoto Hanabata, Koji Kuwana, Yukio Hanamoto, Fumio Oi | 1991-10-22 |
| 4500721 | Process for producing benzaldehydes | Hiroshi Yamachika | 1985-02-19 |
| 4220592 | Synthesis of substituted phenylacetic acid | Keiji Kagawa, Naoya Kanda, Fujio Masuko | 1980-09-02 |