Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5792585 | Radiation-sensitive positive resist composition | Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa | 1998-08-11 |
| 5783355 | Radiation-sensitive positive resist composition | Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa | 1998-07-21 |
| 5736292 | Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups | Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa | 1998-04-07 |
| 5714620 | Polyhydric phenol compound and positive resist composition comprising the same | Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa | 1998-02-03 |
| 5587492 | Polyhydric phenol compound and positive resist composition comprising the same | Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa | 1996-12-24 |
| 5436107 | Positive resist composition | Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa | 1995-07-25 |
| 5413895 | Positive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound. | Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Yasunori Uetani | 1995-05-09 |
| 5368987 | Process for producing resist composition | Yukio Hanamoto, Hiroshi Takagaki | 1994-11-29 |
| 5360696 | Resist composition | Yukio Hanamoto, Hiroshi Takagaki | 1994-11-01 |