Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8344039 | Three-dimensional pattern forming material | — | 2013-01-01 |
| 7534547 | Optically active compound and photosensitive resin composition | Masahiro Sato, Junko Katayama, Satsuki Kitajima, Atsushi Niwa | 2009-05-19 |
| 6921623 | Active components and photosensitive resin composition containing the same | Masahiro Sato, Junko Katayama, Satsuki Kitajima | 2005-07-26 |
| 6653043 | Active particle, photosensitive resin composition, and process for forming pattern | — | 2003-11-25 |
| 6534235 | Photosensitive resin composition and process for forming pattern | Tokugen Yasuda | 2003-03-18 |
| 6478412 | Piezoelectric thin film device, its production method, and ink-jet recording head | — | 2002-11-12 |
| 6183935 | Inorganic-containing photosensitive resin composition and method for forming inorganic pattern | Tokugen Yasuda | 2001-02-06 |
| 5861229 | Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound | Haruyoshi Osaki, Fumio Oi, Yasunori Uetani, Takeshi Hioki | 1999-01-19 |
| 5456996 | Radiation-sensitive positive resist composition | Haruyoshi Ozaki, Fumio Oi, Yasunori Uetani, Takeshi Hioki | 1995-10-10 |
| 5456995 | Radiation-sensitive positive resist composition | Haruyoshi Ozaki, Fumio Oi, Yasunori Uetani, Takeshi Hioki | 1995-10-10 |
| 5378586 | Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester | Yasunori Uetani, Hirotoshi Nakanishi, Koji Kuwana, Fumio Oi | 1995-01-03 |
| 5290656 | Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound | Yasunori Uetani, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto, Fumio Oi +1 more | 1994-03-01 |
| 5124228 | Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester | Yasunori Uetani, Hirotoshi Nakanishi, Koji Kuwana, Fumio Oi | 1992-06-23 |
| 5059507 | Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin | Yasunori Uetani, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto, Fumio Oi | 1991-10-22 |
| 4863829 | Positive type high gamma-value photoresist composition with novolak resin possessing | Akihiro Furuta, Seimei Yasui, Osamu Hiroaki, Naoyoshi Jinno | 1989-09-05 |
| 4812551 | Novolak resin for positive photoresist | Fumio Oi, Haruyoshi Osaki, Akihiro Furuta, Yukikazu Uemura, Takao Ninomiya +1 more | 1989-03-14 |
| 4696886 | Positive photoresist composition with m-hydroxy-.alpha.-methylstyrene homopolymer and quinonediazide compound | Akihiro Furuta, Seimei Yasui, Kunihiko Tanaka | 1987-09-29 |
| 4414230 | Plastic container improved in barrier properties against gases and water vapor | Takashi Maruyama, Katsuji Ueno | 1983-11-08 |
| 4414365 | Process for producing an aromatic polyester composition | Hiroaki Sugimoto | 1983-11-08 |
| 4349659 | Process for producing aromatic polyester | Yasuyuki Kato, Hiroaki Sugimoto | 1982-09-14 |