Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10346956 | Image processing device | Tomohide Maeda | 2019-07-09 |
| 10321023 | Image processing apparatus and image processing method | Qinhe Wang | 2019-06-11 |
| 10297057 | Image processing device and image processing method which process an image based on histogram data in the image | Yuu Hasegawa | 2019-05-21 |
| 10110784 | Image processing apparatus and image processing method | Qinhe Wang | 2018-10-23 |
| 10047029 | Process for producing alkylene oxide adduct and alkylene oxide adduct | Kazuhisa Okada | 2018-08-14 |
| 7305499 | DMA controller for controlling and measuring the bus occupation time value for a plurality of DMA transfers | Nobuo Higaki, Tetsuya Tanaka, Tsuneyuki Suzuki | 2007-12-04 |
| 7273653 | Resin film and manufacturing method for the same, and resin laminated metal sheet using said resin film and manufacturing method for the same | Yasuhide Yoshida, Hiroki Iwasa, Hiroshi Kubo, Takeshi Suzuki, Keiji Sugawara +1 more | 2007-09-25 |
| 6598198 | Deinterleaving device that releases a plurality of types of interleaving simultaneously | Kaoru Iwakuni | 2003-07-22 |
| 6247034 | Fast fourier transforming apparatus and method, variable bit reverse circuit, inverse fast fourier transforming apparatus and method, and OFDM receiver and transmitter | Yuji Nakai | 2001-06-12 |
| 6197245 | Process for producing hollow resin molded article | Nobuhiro Usui, Toru Inoue | 2001-03-06 |
| 6187251 | Process for producing thermoplastic resin hollow molded article | Nobuhiro Usui | 2001-02-13 |
| 6115728 | Fast fourier transforming apparatus and method, variable bit reverse circuit, inverse fast fourier transforming apparatus and method, and OFDM receiver and transmitter | Yuji Nakai | 2000-09-05 |
| 5922270 | Process for producing molded article having a hollow portion from a thermoplastic resin | Masahito Matsumoto, Nobuhiro Usui, Satoru Funakoshi | 1999-07-13 |
| 5862242 | Speaker | Hiroyuki Takewa, Kazue Satoh, Mikio Iwasa, Kuniaki Sakai | 1999-01-19 |
| 5664024 | Loudspeaker | Kazue Satoh, Hiroyuki Takewa, Mikio Iwasa, Shinya Mizone, Kuniaki Sakai | 1997-09-02 |
| 5354644 | Photoresist compositions comprising styryl compound | Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Takeshi Hioki, Jun Tomioka | 1994-10-11 |
| 4863829 | Positive type high gamma-value photoresist composition with novolak resin possessing | Makoto Hanabata, Seimei Yasui, Osamu Hiroaki, Naoyoshi Jinno | 1989-09-05 |
| 4812551 | Novolak resin for positive photoresist | Fumio Oi, Haruyoshi Osaki, Yukikazu Uemura, Takao Ninomiya, Yasunori Uetani +1 more | 1989-03-14 |
| 4696886 | Positive photoresist composition with m-hydroxy-.alpha.-methylstyrene homopolymer and quinonediazide compound | Makoto Hanabata, Seimei Yasui, Kunihiko Tanaka | 1987-09-29 |
| 4309513 | Novel resin compositions based on polyphenylene ether | Katsuji Ueno, Haruo Inoue | 1982-01-05 |
| 4302528 | Process for producing photo-curable composite materials useful for preparing stencils | Takezo Sano, Haruo Inoue | 1981-11-24 |
| 4288529 | Use of photo-curable composite materials to make a stencil | Takezo Sano, Haruo Inoue | 1981-09-08 |
| 4247621 | Original pattern plate obtained by use of photo-sensitive resin composition | Takezo Sano, Tadanori Inoue, Yukikazu Uemura | 1981-01-27 |
| 4216287 | Photo-curable composite containing a screen material in a liquid resin | Takezo Sano, Haruo Inoue | 1980-08-05 |