Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8956981 | Methods of eliminating pattern collapse on photoresist patterns | Jon Daley | 2015-02-17 |
| 8859195 | Methods of lithographically patterning a substrate | Scott E. Sills, Hiroyuki Mori, Troy Gugel, Paul D. Shirley, Lijing Gou +1 more | 2014-10-14 |
| 8552538 | Methods of eliminating pattern collapse on photoresist patterns | Jon Daley | 2013-10-08 |
| 8309297 | Methods of lithographically patterning a substrate | Scott E. Sills, Hiroyuki Mori, Troy Gugel, Paul D. Shirley, Lijing Gou +1 more | 2012-11-13 |
| 8163468 | Method of reducing photoresist defects during fabrication of a semiconductor device | Lijing Gou, Scott E. Sills, Hiroyuki Mori, Paul D. Shirley, Troy Gugel +1 more | 2012-04-24 |
| 7846623 | Resist pattern and reflow technology | — | 2010-12-07 |
| 7687406 | Methods of eliminating pattern collapse on photoresist patterns | Jon Daley | 2010-03-30 |
| 7538036 | Methods of forming openings, and methods of forming container capacitors | Brett W. Busch, Luan C. Tran, Ardavan Niroomand, Fred Fishburn, Ulrich Boettiger +1 more | 2009-05-26 |
| 7402379 | Resist exposure system and method of forming a pattern on a resist | — | 2008-07-22 |
| 7371509 | Resist pattern and reflow technology | — | 2008-05-13 |
| 7169545 | Resist exposure system and method of forming a pattern on a resist | — | 2007-01-30 |
| 7153778 | Methods of forming openings, and methods of forming container capacitors | Brett W. Busch, Luan C. Tran, Ardavan Niroomand, Fred Fishburn, Ulrich Boettiger +1 more | 2006-12-26 |
| 7119025 | Methods of eliminating pattern collapse on photoresist patterns | Jon Daley | 2006-10-10 |
| 6943432 | Semiconductor constructions | — | 2005-09-13 |
| 6905973 | Methods of forming semiconductor constructions | — | 2005-06-14 |
| 6875552 | Photoresist composition and method of making | — | 2005-04-05 |
| 6713404 | Methods of forming semiconductor constructions | — | 2004-03-30 |
| 6599683 | Photoresist developer with reduced resist toppling and method of using same | Kevin J. Torek | 2003-07-29 |
| 5876895 | Photosensitive resin composition for color filter | Naoki Takeyama, Shigeki Yamamoto | 1999-03-02 |
| 5731110 | Photoresist composition for use in color filters | Naoki Takeyama, Shigeki Yamamoto | 1998-03-24 |
| 5686585 | Azo dyes for use in color filters and method for production of color filters | Naoki Takeyama, Shigeki Yamamoto | 1997-11-11 |
| 5492790 | Positive photoresist composition containing a dissolution inhibitor and a dye in an organic solvent | — | 1996-02-20 |
| 5478680 | Color filter | Naoki Takeyama, Shigeki Yamamoto | 1995-12-26 |