Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7374857 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | Tsuneaki Maesawa, Masayuki Endo, Masaru Sasago | 2008-05-20 |
| RE40211 | Diazodisulfones | Masaaki Nakahata, Hirotoshi Fujie, Keiji Oono | 2008-04-01 |
| 7312014 | Resist compositions | Tsuneaki Maesawa | 2007-12-25 |
| 6723483 | Sulfonium salt compounds | Keiji Oono, Kazuhito Fukasawa, Kazunori Sakamoto, Motoshige Sumino, Shigeaki Imazeki | 2004-04-20 |
| 6656660 | Resist composition | Hirotoshi Fujie, Naoki Takeyama, Koji Ichikawa | 2003-12-02 |
| 6586152 | Agent for reducing substrate dependence | Naoki Katano, Tomoko Kiryu | 2003-07-01 |
| 6033826 | Polymer and resist material | Hirotoshi Fujie, Keiji Oono | 2000-03-07 |
| 5976759 | Polymer composition and resist material | Hirotoshi Fujie, Keiji Oono | 1999-11-02 |
| 5973094 | Functional polymers | Motoshige Sumino, Tsuneaki Maesawa | 1999-10-26 |
| 5780206 | Fine pattern forming process using a resist composition sensitive to deep ultraviolet light | Takanori Yasuda, Akiko Katsuyama, Kazuhiro Yamashita | 1998-07-14 |
| 5695910 | Resist composition for deep ultraviolet light | Takanori Yasuda, Akiko Katsuyama, Kazuhiro Yamashita | 1997-12-09 |
| 5677112 | Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition | Keiji Oono, Hiroshi Matsuda, Masayuki Endo, Satoshi Kobayashi | 1997-10-14 |
| 5670299 | Pattern formation process | Hirotoshi Fujie, Keiji Oono, Takaaki Negishi | 1997-09-23 |
| 5627006 | Resist material | Keiji Oono, Hirotoshi Fujie | 1997-05-06 |
| 5576359 | Deep ultraviolet absorbent composition | Keiji Oono, Hiroshi Matsuda, Masayuki Endo, Satoshi Kobayashi | 1996-11-19 |
| 5558971 | Resist material | Takaai Negishi, Akiko Katsuyama, Masayuki Endo | 1996-09-24 |
| 5558976 | Pattern formation method | Takaaki Negishi, Akiko Katsuyama, Masayuki Endo | 1996-09-24 |
| 5498748 | Anthracene derivatives | Keiji Oono, Hiroshi Matsuda | 1996-03-12 |
| 5468589 | Resist material and pattern formation process | Hirotoshi Fujie, Keiji Oono, Takaaki Negishi | 1995-11-21 |
| 5389491 | Negative working resist composition | Yoshiyuki Tani, Masayuki Endo, Takanori Yasuda | 1995-02-14 |
| 5350660 | Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere | Masaaki Nakahata, Hirotoshi Fujie, Keiji Oono | 1994-09-27 |
| 5272036 | Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method | Yoshiyuki Tani, Masayuki Endo, Kazufumi Ogawa, Masaaki Nakahata | 1993-12-21 |
| 5216135 | Diazodisulfones | Masaaki Nakahata, Hirotoshi Fujie, Keiji Oono | 1993-06-01 |
| 5128062 | Optically active compounds and liquid crystal compositions containing such compounds | Shogo Kobayashi, Shigeki Ishibashi, Takaaki Negishi | 1992-07-07 |
| 5114615 | Liquid crystal compounds and intermediates thereof | Shigeki Ishibashi, Kouzaburou Nakamura, Tohru Maruno, Masaaki Nakahata, Takaaki Negishi | 1992-05-19 |