Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7741242 | Palladium catalyst composition | Shu Kobayashi, Atsunori Sano | 2010-06-22 |
| 7618914 | Method for producing hydroxylamine compound using platinum catalyst fixed on ion-exchange resin | Mutsumi Sato | 2009-11-17 |
| RE40211 | Diazodisulfones | Fumiyoshi Urano, Masaaki Nakahata, Hirotoshi Fujie | 2008-04-01 |
| 6723483 | Sulfonium salt compounds | Kazuhito Fukasawa, Kazunori Sakamoto, Fumiyoshi Urano, Motoshige Sumino, Shigeaki Imazeki | 2004-04-20 |
| 6033826 | Polymer and resist material | Fumiyoshi Urano, Hirotoshi Fujie | 2000-03-07 |
| 5976759 | Polymer composition and resist material | Fumiyoshi Urano, Hirotoshi Fujie | 1999-11-02 |
| 5677112 | Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition | Fumiyoshi Urano, Hiroshi Matsuda, Masayuki Endo, Satoshi Kobayashi | 1997-10-14 |
| 5670299 | Pattern formation process | Fumiyoshi Urano, Hirotoshi Fujie, Takaaki Negishi | 1997-09-23 |
| 5627006 | Resist material | Fumiyoshi Urano, Hirotoshi Fujie | 1997-05-06 |
| 5576359 | Deep ultraviolet absorbent composition | Fumiyoshi Urano, Hiroshi Matsuda, Masayuki Endo, Satoshi Kobayashi | 1996-11-19 |
| 5498748 | Anthracene derivatives | Fumiyoshi Urano, Hiroshi Matsuda | 1996-03-12 |
| 5468589 | Resist material and pattern formation process | Fumiyoshi Urano, Hirotoshi Fujie, Takaaki Negishi | 1995-11-21 |
| 5350660 | Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere | Fumiyoshi Urano, Masaaki Nakahata, Hirotoshi Fujie | 1994-09-27 |
| 5216135 | Diazodisulfones | Fumiyoshi Urano, Masaaki Nakahata, Hirotoshi Fujie | 1993-06-01 |