Issued Patents All Time
Showing 76–82 of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5198323 | Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component | Teijiro Kitao, Masaru Matsuoka, Ryotaro Hanawa, Naoki Takeyama, Takeshi Hioki +1 more | 1993-03-30 |
| 5188920 | Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound | Hiroshi Moriuma, Haruyoshi Osaki, Takeshi Hioki | 1993-02-23 |
| 5130225 | Positive resist composition comprising a cyclic dimer of isopropenyl phenol, also known as a 1,1,3 trimethyl-3-hydroxyphenyl indane | — | 1992-07-14 |
| 5124228 | Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester | Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Fumio Oi | 1992-06-23 |
| 5080997 | Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture | Takeshi Hioki, Koji Kuwana, Jun Tomioka, Hirotoshi Nakanishi, Yukio Hanamoto +1 more | 1992-01-14 |
| 5059507 | Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin | Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto, Fumio Oi | 1991-10-22 |
| 4812551 | Novolak resin for positive photoresist | Fumio Oi, Haruyoshi Osaki, Akihiro Furuta, Yukikazu Uemura, Takao Ninomiya +1 more | 1989-03-14 |