Issued Patents All Time
Showing 26–50 of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6677102 | Chemical amplifying type positive resist composition | Yoshiko Miya, Hiroaki Fujishima | 2004-01-13 |
| 6632581 | Chemically amplified positive resist composition | Seong Hyeon KIM | 2003-10-14 |
| 6627381 | Chemical amplification type positive resist composition | Akira Kamabuchi | 2003-09-30 |
| 6579659 | Chemically amplified positive resist composition | Airi Yamada, Yoshiko Miya, Yoshiyuki Takata | 2003-06-17 |
| 6569596 | Negative working chemical amplification type resist compositions | Airi Yamada, Hiroki Inoue | 2003-05-27 |
| 6548221 | Chemical amplification type positive resist composition | Hiroki Inoue | 2003-04-15 |
| 6548220 | Chemical amplifying type positive resist composition and sulfonium salt | Kenji Oohashi, Akira Kamabuchi | 2003-04-15 |
| 6495307 | Chemically amplified positive resist composition | Hiroaki Fujishima, Yoshiyuki Takata | 2002-12-17 |
| 6495306 | Chemically amplified positive resist composition | Hiroaki Fujishima, Yoshiyuki Takata | 2002-12-17 |
| 6475699 | Chemically amplified positive resist composition | Seong Hyeon KIM, Yoshiyuki Takata | 2002-11-05 |
| 6406830 | Chemical amplification type positive resist compositions and sulfonium salts | Hiroki Inoue | 2002-06-18 |
| 6383709 | Positive resist composition comprising N-(n-octylsulfonyloxy) succinimide | Jun Tomioka, Sang Ho Lee | 2002-05-07 |
| 6383713 | Chemical amplification type positive resist composition | Hiroki Inoue | 2002-05-07 |
| 6383708 | Positive resist composition | Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki, Ryotaro Hanawa | 2002-05-07 |
| 6348297 | Chemical amplification type positive resist | Kenji Oohashi, Hiroki Inoue | 2002-02-19 |
| 6245478 | Resist composition | Ichiki Takemoto | 2001-06-12 |
| 6239231 | Chemical amplifying type positive resist composition | Hiroaki Fujishima, Karou Araki | 2001-05-29 |
| 6068962 | Positive resist composition | Hiroshi Moriuma, Jun Tomioka | 2000-05-30 |
| 5876904 | Method of providing a positive resist pattern | — | 1999-03-02 |
| 5861229 | Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound | Haruyoshi Osaki, Fumio Oi, Makoto Hanabata, Takeshi Hioki | 1999-01-19 |
| 5849457 | Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and .gamma. - | Katsuhiko Namba, Kaoru Tatekawa, Hiroshi Moriuma | 1998-12-15 |
| 5807656 | Polyhydroxy compound and a positive photoresist containing the same | Koji Ichikawa, Haruyoshi Osaki, Yoshiyuki Takata | 1998-09-15 |
| 5792585 | Radiation-sensitive positive resist composition | Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Ryotaro Hanawa | 1998-08-11 |
| 5792586 | Positive resist composition comprising a novolac resin made from a cycloalkyl substituted phenol | Kazuhiko Hashimoto, Haruyoshi Osaki | 1998-08-11 |
| 5783355 | Radiation-sensitive positive resist composition | Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Ryotaro Hanawa | 1998-07-21 |