Issued Patents All Time
Showing 76–100 of 113 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6720273 | DEVICE AND METHOD FOR THE HIGH-FREQUENCY ETCHING OF A SUBSTRATE USING A PLASMA ETCHING INSTALLATION AND DEVICE AND METHOD FOR IGNITING A PLASMA AND FOR PULSING THE PLASMA OUT PUT OR ADJUSTING THE SAME UPWARDS | Volker Becker, Andrea Schilp, Thomas Beck | 2004-04-13 |
| 6720268 | Method for anisotropic plasma etching of semiconductors | Andrea Schilp | 2004-04-13 |
| 6709546 | Device and method for etching a substrate by using an inductively coupled plasma | Klaus Breitschwerdt, Volker Becker, Andrea Schilp | 2004-03-23 |
| 6677249 | Method for manufacturing breakaway layers for detaching deposited layer systems | Wilhelm Frey, Hans Artmann | 2004-01-13 |
| 6645800 | Method for the production of a field-effect structure | Wilhelm Frey, Klaus Heyers | 2003-11-11 |
| 6592664 | Method and device for epitaxial deposition of atoms or molecules from a reactive gas on a deposition surface of a substrate | Wilhelm Frey, Klaus Heyers | 2003-07-15 |
| 6558559 | Method of manufacturing micromechanical surface structures by vapor-phase etching | Volker Becker, Michael Offenberg, Andrea Schilp | 2003-05-06 |
| 6531068 | Method of anisotropic etching of silicon | Andrea Schilp | 2003-03-11 |
| 6531031 | Plasma etching installation | Volker Becker, Andrea Schilp, Thomas Beck | 2003-03-11 |
| 6462566 | Sensor element | Martin Schoefthaler, Ralf Schellin, Bernd Maihoefer, Markus Lutz, Harald Emmerich +1 more | 2002-10-08 |
| 6372656 | Method of producing a radiation sensor | Wilhelm Frey | 2002-04-16 |
| 6360604 | Acceleration sensor | Bernhard Elsner, Wilhelm Frey | 2002-03-26 |
| 6340644 | Method for applying a protecting lacquer on a wafer | Volker Becker, Andrea Schilp | 2002-01-22 |
| 6324910 | Method and device for measuring a physical variable | Karsten Funk, Hans-Martin Kulcke, Andrea Schilp | 2001-12-04 |
| 6303512 | Anisotropic, fluorine-based plasma etching method for silicon | Andrea Schilp | 2001-10-16 |
| 6284148 | Method for anisotropic etching of silicon | Andrea Schilp | 2001-09-04 |
| 6268232 | Method for fabricating a micromechanical component | Helmut Skapa, Horst Muenzel, Michael Offenberg, Heinz-Georg Vossenberg | 2001-07-31 |
| 6259350 | Sensor and method for manufacturing a sensor | Roland Mueller-Fiedler, Christoph Treutler, Michael Gundlach, Manfred Moellendorf, Steffen Schmidt +3 more | 2001-07-10 |
| 6217647 | Method for producing a monocrystalline layer of a conducting or semiconducting material | Wilhelm Frey | 2001-04-17 |
| 6214161 | Method and apparatus for anisotropic etching of substrates | Volker Becker, Andrea Schilp | 2001-04-10 |
| 6214243 | Process for producing a speed of rotation coriolis sensor | Horst Muenzel, Michael Offenberg, Andrea Schilp, Markus Lutz | 2001-04-10 |
| 6200822 | Method for detecting the transition between different materials in semiconductor structures | Volker Becker, Andrea Schilp | 2001-03-13 |
| 6174746 | Method of producing optical waveguides | Manfred Moellendorf, Wilhelm Frey | 2001-01-16 |
| 6127273 | Process for anisotropic plasma etching of different substrates | Andrea Schilp | 2000-10-03 |
| 6117701 | Method for manufacturing a rate-of-rotation sensor | Nicholas Ian Buchan, Horst Muenzel, Michael Offenberg, Udo Bischof, Markus Lutz | 2000-09-12 |