FL

Franz Laermer

Robert Bosch Gmbh: 112 patents #4 of 19,740Top 1%
📍 Weil der Stadt, DE: #1 of 225 inventorsTop 1%
Overall (All Time): #11,216 of 4,157,543Top 1%
113
Patents All Time

Issued Patents All Time

Showing 51–75 of 113 patents

Patent #TitleCo-InventorsDate
7785486 Method of etching structures into an etching body using a plasma Andrea Urban, Klaus Breitschwerdt, Volker Becker 2010-08-31
7709933 Structural element having a porous region at least regionally provided with a cover layer and its use as well as method for setting the thermal conductivity of a porous region Hans Artmann, Thorsten Pannek, Hans-Peter Trah 2010-05-04
7648611 Plasma etching equipment Andrea Schilp 2010-01-19
7642545 Layer and system with a silicon layer and a passivation layer, method for production of a passivation layer on a silicon layer and use thereof Andrea Urban, Klaus Breitschwerdt 2010-01-05
7582514 Microelectromechanical systems encapsulation process with anti-stiction coating Cyril Vancura, Markus Ulm, Brian Stark, Matthias Metz, Tino Fuchs +1 more 2009-09-01
7563633 Microelectromechanical systems encapsulation process Markus Ulm, Brian Stark, Matthias Metz, Tino Fuchs, Silvia Kronmueller 2009-07-21
7531229 Microstructured component and method for its manufacture Udo-Martin Gomez 2009-05-12
7398588 SOI component comprising margins for separation Oliver Stoll, Gilbert Moersch, Gottfried Flik, Klaus Kuettner 2008-07-15
7361287 Method for etching structures in an etching body by means of a plasma 2008-04-22
7321156 Device for capacitive pressure measurement and method for manufacturing a capacitive pressure measuring device Frank Fischer, Hans-Peter Trah, Lars Metzger 2008-01-22
7312553 Micromechanical component and method for producing same 2007-12-25
7288485 Device and method for anisotropic plasma etching of a substrate, particularly a silicon element Klaus Breitschwerdt, Bernd Kutsch 2007-10-30
7285228 Device and method for anisotropic plasma etching of a substrate, a silicon body in particular Klaus Breitschwerdt, Bernd Kutsch 2007-10-23
7201852 Method for removing defects from silicon bodies by a selective etching process Richard Spitz, Helga Uebbing, Doerte Eimers-Klose, Andrea Schilp 2007-04-10
7166536 Methods for plasma etching of silicon Andrea Schilp, Bernhard Elsner 2007-01-23
7149070 Holding device, in particular for fixing a semiconductor wafer in a plasma etching device, and method for supplying heat to or dissipating heat from a substrate Klaus Breitschwerdt, Andrea Urban 2006-12-12
7094706 Device and method for etching a substrate by using an inductively coupled plasma Klaus Breitschwerdt, Volker Becker, Andrea Schilp 2006-08-22
7052623 Method for processing silicon using etching processes Volker Becker, Andrea Schilp 2006-05-30
6974709 Method and device for providing a semiconductor etching end point and for detecting the end point Klaus Breitschwerdt 2005-12-13
6960536 Method for producing integrated microsystems Wilhelm Frey, Christoph Duenn 2005-11-01
6926844 Plasma etching method having pulsed substrate electrode power Andrea Schilp 2005-08-09
6911348 Device and method for determining the lateral undercut of a structured surface layer Volker Becker, Andrea Schilp 2005-06-28
6899817 Device and method for etching a substrate using an inductively coupled plasma Volker Becker, Andrea Schilp 2005-05-31
6874511 Method of avoiding or eliminating deposits in the exhaust area of a vacuum system Bernd Kutsch 2005-04-05
6726815 Electrochemical etching cell Hans Artmann, Wilhelm Frey 2004-04-27