Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7288485 | Device and method for anisotropic plasma etching of a substrate, particularly a silicon element | Klaus Breitschwerdt, Franz Laermer | 2007-10-30 |
| 7285228 | Device and method for anisotropic plasma etching of a substrate, a silicon body in particular | Franz Laermer, Klaus Breitschwerdt | 2007-10-23 |
| 6874511 | Method of avoiding or eliminating deposits in the exhaust area of a vacuum system | Franz Laermer | 2005-04-05 |