Issued Patents All Time
Showing 1–25 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7811941 | Device and method for etching a substrate using an inductively coupled plasma | Volker Becker, Franz Laermer | 2010-10-12 |
| 7648611 | Plasma etching equipment | Franz Laermer | 2010-01-19 |
| 7201852 | Method for removing defects from silicon bodies by a selective etching process | Richard Spitz, Helga Uebbing, Doerte Eimers-Klose, Franz Laermer | 2007-04-10 |
| 7166536 | Methods for plasma etching of silicon | Franz Laermer, Bernhard Elsner | 2007-01-23 |
| 7094706 | Device and method for etching a substrate by using an inductively coupled plasma | Klaus Breitschwerdt, Volker Becker, Franz Laermer | 2006-08-22 |
| 7052623 | Method for processing silicon using etching processes | Volker Becker, Franz Laermer | 2006-05-30 |
| 6926844 | Plasma etching method having pulsed substrate electrode power | Franz Laermer | 2005-08-09 |
| 6911348 | Device and method for determining the lateral undercut of a structured surface layer | Volker Becker, Franz Laermer | 2005-06-28 |
| 6899817 | Device and method for etching a substrate using an inductively coupled plasma | Volker Becker, Franz Laermer | 2005-05-31 |
| 6720268 | Method for anisotropic plasma etching of semiconductors | Franz Laermer | 2004-04-13 |
| 6720273 | DEVICE AND METHOD FOR THE HIGH-FREQUENCY ETCHING OF A SUBSTRATE USING A PLASMA ETCHING INSTALLATION AND DEVICE AND METHOD FOR IGNITING A PLASMA AND FOR PULSING THE PLASMA OUT PUT OR ADJUSTING THE SAME UPWARDS | Volker Becker, Franz Laermer, Thomas Beck | 2004-04-13 |
| 6709546 | Device and method for etching a substrate by using an inductively coupled plasma | Klaus Breitschwerdt, Volker Becker, Franz Laermer | 2004-03-23 |
| 6558559 | Method of manufacturing micromechanical surface structures by vapor-phase etching | Volker Becker, Franz Laermer, Michael Offenberg | 2003-05-06 |
| 6531068 | Method of anisotropic etching of silicon | Franz Laermer | 2003-03-11 |
| 6531031 | Plasma etching installation | Volker Becker, Franz Laermer, Thomas Beck | 2003-03-11 |
| 6515491 | Structural body having a stochastic surface patterning as well as a capacitive sensor having such a structural body | Michael Kupzig, Karsten Funk | 2003-02-04 |
| 6340644 | Method for applying a protecting lacquer on a wafer | Volker Becker, Franz Laermer | 2002-01-22 |
| 6324910 | Method and device for measuring a physical variable | Karsten Funk, Hans-Martin Kulcke, Franz Laermer | 2001-12-04 |
| 6303512 | Anisotropic, fluorine-based plasma etching method for silicon | Franz Laermer | 2001-10-16 |
| 6284148 | Method for anisotropic etching of silicon | Franz Laermer | 2001-09-04 |
| 6214161 | Method and apparatus for anisotropic etching of substrates | Volker Becker, Franz Laermer | 2001-04-10 |
| 6214243 | Process for producing a speed of rotation coriolis sensor | Horst Muenzel, Franz Laermer, Michael Offenberg, Markus Lutz | 2001-04-10 |
| 6200822 | Method for detecting the transition between different materials in semiconductor structures | Volker Becker, Franz Laermer | 2001-03-13 |
| 6127273 | Process for anisotropic plasma etching of different substrates | Franz Laermer | 2000-10-03 |
| 6062082 | Micromechanical acceleration or coriolis rotation-rate sensor | Gero Guenther, Karsten Funk, Franz Laermer | 2000-05-16 |