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Integrated circuit (IC) packages employing a capacitor-embedded, redistribution layer (RDL) substrate for interfacing an IC chip(s) to a package substrate, and related methods |
Giridhar Nallapati, William Stone, Jianwen Xu, Jonghae Kim, Periannan Chidambaram +1 more |
2025-02-04 |
| 11973019 |
Deep trench capacitors in an inter-layer medium on an interconnect layer of an integrated circuit die and related methods |
Stanley Seungchul Song, Giridhar Nallapati, Periannan Chidambaram |
2024-04-30 |
| 10833017 |
Contact for semiconductor device |
Yanxiang Liu, Haining Yang, Youseok Suh, Junjing Bao |
2020-11-10 |
| 9941156 |
Systems and methods to reduce parasitic capacitance |
Shiqun Gu, Vidhya Ramachandran, Christine Hau-Riege, John Jianhong Zhu, Jeffrey Junhao Xu +2 more |
2018-04-10 |
| 9269492 |
Bone frame, low resistance via coupled metal oxide-metal (MOM) orthogonal finger capacitor |
John Jianhong Zhu, PR Chidambaram, Lixin Ge, Bin Yang |
2016-02-23 |
| 9252104 |
Complementary back end of line (BEOL) capacitor |
John Jianhong Zhu, Bin Yang, PR Chidambaram, Lixin Ge |
2016-02-02 |
| 9245971 |
Semiconductor device having high mobility channel |
Bin Yang, P R Chidambaram, John Jianhong Zhu, Da Yang, Ravi M. Todi +4 more |
2016-01-26 |
| 8980708 |
Complementary back end of line (BEOL) capacitor |
John Jianhong Zhu, Bin Yang, P R Chidambaram, Lixin Ge |
2015-03-17 |
| 8241927 |
Methods relating to capacitive monitoring of layer characteristics during back end-of the-line processing |
Yongsik Moon, Roderick A. Augur, Eden Zielinski |
2012-08-14 |
| 8105942 |
CMP-first damascene process scheme |
Tibor Bolom |
2012-01-31 |