Issued Patents All Time
Showing 101–125 of 135 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7486878 | Offset correction methods and arrangement for positioning and inspecting substrates | Jack Chen, Ben Mooring, Stephen J. Cain | 2009-02-03 |
| 7480571 | Apparatus and methods for improving the stability of RF power delivery to a plasma load | Arthur M. Howald, Andras Kuthi | 2009-01-20 |
| 7479236 | Offset correction techniques for positioning substrates | Jack Chen, Ben Mooring, Stephen J. Cain | 2009-01-20 |
| 7413673 | Method for adjusting voltage on a powered Faraday shield | Shrikant Lohokare, Andras Kuthi | 2008-08-19 |
| 7403001 | Methods and apparatus for measuring morphology of a conductive film on a substrate | — | 2008-07-22 |
| 7347915 | Plasma in-situ treatment of chemically amplified resist | Douglas Keil, Wan-Lin Chen, Eric A. Hudson, S. M. Reza Sadjadi, Mark Wilcoxson | 2008-03-25 |
| 7295954 | Expert knowledge methods and systems for data analysis | Puneet Yadav | 2007-11-13 |
| 7282909 | Methods and apparatus for determining the thickness of a conductive layer on a substrate | — | 2007-10-16 |
| 7242185 | Method and apparatus for measuring a conductive film at the edge of a substrate | — | 2007-07-10 |
| 7239737 | User interface for quantifying wafer non-uniformities and graphically explore significance | Jorge Luque, Mark Wilcoxson | 2007-07-03 |
| 7232766 | System and method for surface reduction, passivation, corrosion prevention and activation of copper surface | Shrikant Lohokare | 2007-06-19 |
| 7217649 | System and method for stress free conductor removal | Shrikant Lohokare | 2007-05-15 |
| 7173418 | Methods and apparatus for optimizing an electrical response to a set of conductive layers on a substrate | — | 2007-02-06 |
| 7164282 | Methods and apparatus for determining an average electrical response to a conductive layer on a substrate | Michael S. Leonard, Benjamin W. Mooring, Candi Kristoffersen | 2007-01-16 |
| 7140374 | System, method and apparatus for self-cleaning dry etch | Shrikant Lohokare, Arthur M. Howald, Yunsang Kim | 2006-11-28 |
| 7129167 | Methods and systems for a stress-free cleaning a surface of a substrate | Shrikant Lohokare, Yunsang Kim, Simon McClatchie | 2006-10-31 |
| 7130767 | Computer-implemented data presentation techniques for a plasma processing system | Puneet Yadav | 2006-10-31 |
| 7086347 | Apparatus and methods for minimizing arcing in a plasma processing chamber | Arthur M. Howald, Andras Kuthi, Butch Berney | 2006-08-08 |
| 7078344 | Stress free etch processing in combination with a dynamic liquid meniscus | Michael Ravkin, Mikhail Korolik, Puneet Yadav | 2006-07-18 |
| 7067034 | Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma | — | 2006-06-27 |
| 7022611 | Plasma in-situ treatment of chemically amplified resist | Douglas Keil, Wan-Lin Chen, Eric A. Hudson, S. M. Reza Sadjadi, Mark Wilcoxson | 2006-04-04 |
| 7009281 | Small volume process chamber with hot inner surfaces | Tuqiang Ni | 2006-03-07 |
| 6939796 | System, method and apparatus for improved global dual-damascene planarization | Shrikant Lohokare, David Hemker, Joel M. Cook | 2005-09-06 |
| 6873112 | Method for producing a semiconductor device | Mark Wilcoxson | 2005-03-29 |
| 6842147 | Method and apparatus for producing uniform processing rates | Arthur M. Howald, Andras Kuthi, Mark Wilcoxson | 2005-01-11 |