Issued Patents All Time
Showing 26–50 of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9824896 | Methods and systems for advanced ion control for etching processes | Zhongkui Tan, Ying Wu, Qing Xu, John Drewery | 2017-11-21 |
| 9767991 | Methods and systems for independent control of radical density, ion density, and ion energy in pulsed plasma semiconductor device fabrication | Zhongkui Tan, Ying Wu, Qing Xu | 2017-09-19 |
| 9761459 | Systems and methods for reverse pulsing | Maolin Long, Zhongkui Tan, Ying Wu, Alex Paterson, John Drewery | 2017-09-12 |
| 9741563 | Hybrid stair-step etch | Hua Xiang, Indeog Bae, Sung Jin Jung, Ce Qin, Yoko Yamaguchi | 2017-08-22 |
| RE46464 | Method for forming stair-step structures | Ce Qin, Hyun-Yong YU | 2017-07-04 |
| 9691625 | Methods and systems for plasma etching using bi-modal process gas composition responsive to plasma power level | Zhongkui Tan, Ying Wu, Qing Xu | 2017-06-27 |
| 9673057 | Method for forming stair-step structures | In Deog BAE | 2017-06-06 |
| 9646844 | Method for forming stair-step structures | Hyun-Yong YU | 2017-05-09 |
| 9633867 | Method and apparatus for anisotropic tungsten etching | Zhongkui Tan, Huai-Yu Hsiao | 2017-04-25 |
| 9607848 | Etch process with pre-etch transient conditioning | Wonchul Lee, John Drewery | 2017-03-28 |
| 9583357 | Systems and methods for reverse pulsing | Maolin Long, Zhongkui Tan, Ying Wu, Alex Paterson, John Drewery | 2017-02-28 |
| 9530658 | Continuous plasma etch process | Wonchul Lee | 2016-12-27 |
| 9466502 | Line width roughness improvement with noble gas plasma | Shih-Yuan Cheng, Shenjian Liu, Youn Gi Hong | 2016-10-11 |
| 9418869 | Method to etch a tungsten containing layer | Hua Xiang | 2016-08-16 |
| 9275872 | Method for forming stair-step structures | Hyun-Yong YU | 2016-03-01 |
| 9263284 | Line width roughness improvement with noble gas plasma | Shih-Yuan Cheng, Shenjian Liu, Youn Gi Hong | 2016-02-16 |
| 9257296 | Etch process with pre-etch transient conditioning | Wonchul Lee, John Drewery | 2016-02-09 |
| 9142417 | Etch process with pre-etch transient conditioning | Wonchul Lee, John Drewery | 2015-09-22 |
| 9129902 | Continuous plasma ETCH process | Wonchul Lee | 2015-09-08 |
| 9059116 | Etch with pulsed bias | Amit Jain, Wonchul Lee | 2015-06-16 |
| 8901004 | Plasma etch method to reduce micro-loading | Tom A. Kamp, I. C. Jang, Linda Braly, Shenjian Liu | 2014-12-02 |
| 8802571 | Method of hard mask CD control by Ar sputtering | Wonchul Lee | 2014-08-12 |
| 8753804 | Line width roughness improvement with noble gas plasma | Shih-Yuan Cheng, Shenjian Liu, Youn Gi Hong | 2014-06-17 |
| 8609546 | Pulsed bias plasma process to control microloading | Wonchul Lee, Shenjian Liu, Bryan Pu | 2013-12-17 |
| 8535549 | Method for forming stair-step structures | Ce Qin, Hyun-Yong YU | 2013-09-17 |