Issued Patents All Time
Showing 25 most recent of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10374217 | Apparatus and process for producing electricity storage material | Takumi Mio, Koji Nishi, Sachiko Kubota, Jun ANDO | 2019-08-06 |
| 8933878 | Display apparatus and display method | Yoshikazu Sugiyama | 2015-01-13 |
| 8791989 | Image processing apparatus, image processing method, recording method, and recording medium | Yoshijiro Ushio | 2014-07-29 |
| 8675048 | Image processing apparatus, image processing method, recording method, and recording medium | Yoshijiro Ushio | 2014-03-18 |
| 7868997 | Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method | Mikihiko Ishii, Takashi Gemma | 2011-01-11 |
| 7843550 | Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method | Mikihiko Ishii, Takashi Gemma | 2010-11-30 |
| 6963408 | Method and apparatus for point diffraction interferometry | Mikihiko Ishii, Hisashi Shiozawa, Jun Kawakami, Yasushi Fukutomi | 2005-11-08 |
| 6894763 | Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same | Seiro Murakami, Takaharu Miura, Akikazu Tanimoto, Hideo Mizutani | 2005-05-17 |
| 6522716 | Multilayer-film reflective mirrors, extreme UV microlithography apparatus comprising same, and microelectronic-device manufacturing methods utilizing same | Katsuhiko Murakami | 2003-02-18 |
| 6362926 | Projection exposure apparatus and method | Yasuhiro Omura, Tetsuo Takahashi | 2002-03-26 |
| 6195213 | Projection exposure apparatus and method | Yasuhiro Omura, Tetsuo Takahashi, Masatoshi Ikeda, Shiwen Li | 2001-02-27 |
| 6118596 | Catadioptric reduction projection optical system and method | Sumio Hashimoto, Yutaka Suenaga | 2000-09-12 |
| 6108140 | Catadioptric reduction projection optical system and method | Sumio Hashimoto, Yutaka Suenaga | 2000-08-22 |
| RE36740 | Cata-dioptric reduction projection optical system | Hideo Mizutani, Sumio Hashimoto, Yutaka Suenaga | 2000-06-20 |
| 5898501 | Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens | Jun Suzuki, Takashi Gemma | 1999-04-27 |
| 5844728 | Catadioptric reduction projection optical system | Sumio Hashimoto, Yutaka Suenaga | 1998-12-01 |
| 5793473 | Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same | Motoo Koyama | 1998-08-11 |
| 5774240 | Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques | Akihiro Goto, Takashi Genma, Nobutaka Magome, Naomasa Shiraishi, Toshio Matsuura +2 more | 1998-06-30 |
| 5712735 | Catadioptric reduction projection optical system | Sumio Hashimoto, Yutaka Suenaga | 1998-01-27 |
| 5623473 | Method and apparatus for manufacturing a diffraction grating zone plate | — | 1997-04-22 |
| 5563706 | Interferometric surface profiler with an alignment optical member | Masato Shibuya, Takashi Gemma, Shuji Toyonaga, Keiji Inada | 1996-10-08 |
| 5528390 | Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques | Akihiro Goto, Takashi Genma, Nobutaka Magome, Naomasa Shiraishi, Toshio Matsuura +2 more | 1996-06-18 |
| 5504596 | Exposure method and apparatus using holographic techniques | Akihiro Goto, Takashi Gemma, Nobutaka Magome, Naomasa Shiraishi, Hiroshi Shirasu +1 more | 1996-04-02 |
| 5446556 | Video clock signal generator in an optical scanner in which a mask including a linear scale provides timing for controlling the amplitude of a vibrating mirror | Yoshinori Kuroiwa, Hiroshi Nishida, Hisashi Okugawa, Satoru Kumagai | 1995-08-29 |
| 5307207 | Illuminating optical apparatus | — | 1994-04-26 |