Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12276155 | Connecting fitting construction materials and connecting method therefor | Masanori Kobayashi, Shigeo YAMAGAMI | 2025-04-15 |
| 11746585 | Connection member for construction materials, connecting fitting therefor, connecting structure therefor, and connecting method therefor | Masanori Kobayashi, Shigeo YAMAGAMI | 2023-09-05 |
| 11450436 | Method and apparatus for machine learning | — | 2022-09-20 |
| 10126660 | Multilayer film reflector, method of manufacturing multilayer film reflector, projection optical system, exposure apparatus, and method of manufacturing device | Noriaki Kandaka | 2018-11-13 |
| 8809818 | EUV light source, EUV exposure apparatus, and electronic device manufacturing method | — | 2014-08-19 |
| 8121254 | Optical element, exposure apparatus using this, and device manufacturing method | Takaharu Komiya | 2012-02-21 |
| 7741616 | EUV light source, EUV exposure equipment, and semiconductor device manufacturing method | — | 2010-06-22 |
| 7706058 | Multilayer mirror, method for manufacturing the same, and exposure equipment | Noriaki Kandaka, Takaharu Komiya, Masayuki Shiraishi | 2010-04-27 |
| 7456417 | Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device | Hideya Inoue | 2008-11-25 |
| 7440182 | Multilayer mirror, method for manufacturing the same, and exposure equipment | Noriaki Kandaka, Takaharu Komiya, Masayuki Shiraishi | 2008-10-21 |
| 7417708 | Extreme ultraviolet exposure apparatus and vacuum chamber | — | 2008-08-26 |
| 7385212 | Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus | — | 2008-06-10 |
| 7382527 | EUV multilayer mirror with phase shifting layer | Noriaki Kandaka, Takaharu Komiya, Masayuki Shiraishi | 2008-06-03 |
| 6909774 | Apparatus and methods for surficial milling of selected regions on surfaces of multilayer-film reflective mirrors as used in X-ray optical systems | Tetsuya Oshino, Hiroyuki Kondo, Katsumi Sugisaki, Masaki Yamamoto | 2005-06-21 |
| 6861656 | High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systems | — | 2005-03-01 |
| 6522716 | Multilayer-film reflective mirrors, extreme UV microlithography apparatus comprising same, and microelectronic-device manufacturing methods utilizing same | Yutaka Ichihara | 2003-02-18 |
| 6522717 | Reflective-type soft x-ray microscope | Hiroyuki Kondo | 2003-02-18 |
| 6507641 | X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same | Hiroyuki Kondo, Masayuki Shiraishi, Katsumi Sugisaki | 2003-01-14 |
| 6441963 | Multi-layered mirror | Masayuki Shiraishi | 2002-08-27 |
| 6377655 | Reflective mirror for soft x-ray exposure apparatus | Tokio Kato, Kuninori Shinada | 2002-04-23 |
| 6333961 | Reflection masks, microlithography apparatus using same, and integrated circuit manufacturing methods employing same | — | 2001-12-25 |
| 6295164 | Multi-layered mirror | Masayuki Shiraishi | 2001-09-25 |
| 6160867 | Multi-layer X-ray-reflecting mirrors with reduced internal stress | — | 2000-12-12 |
| 5581605 | Optical element, production method of optical element, optical system, and optical apparatus | Kiyoto Mashima, Takashi Mori, Osamu Tanitsu | 1996-12-03 |
| 5572564 | Reflecting photo mask for x-ray exposure and method for manufacturing the same | — | 1996-11-05 |