Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12383981 | Processing apparatus, and manufacturing method of movable body | Shigeki EGAMI, Yoshio Kawabe, Yosuke TATSUZAKI, Yuichi Shibazaki | 2025-08-12 |
| 12208469 | Processing apparatus and method using irradiation apparatus having a partition member | Yosuke TATSUZAKI | 2025-01-28 |
| 12157184 | Processing apparatus, and manufacturing method of movable body | Yoshio Kawabe, Yosuke TATSUZAKI, Yuichi Shibazaki | 2024-12-03 |
| 12121991 | Processing apparatus, and manufacturing method of movable body | Shigeki EGAMI, Yoshio Kawabe, Yosuke TATSUZAKI, Yuichi Shibazaki | 2024-10-22 |
| 9529251 | Flare-measuring mask, flare-measuring method, and exposure method | — | 2016-12-27 |
| 9030645 | Illumination optical system, exposure apparatus, and exposure method | — | 2015-05-12 |
| 8945802 | Flare-measuring mask, flare-measuring method, and exposure method | — | 2015-02-03 |
| 8800451 | Gas generator | Tetsuya Sawada, Toshihiko Tamura | 2014-08-12 |
| 8699014 | Measuring member, sensor, measuring method, exposure apparatus, exposure method, and device producing method | — | 2014-04-15 |
| 8421998 | Optical system, exposure apparatus, and method of manufacturing electronic device | Takuro Ono | 2013-04-16 |
| 8194322 | Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror | — | 2012-06-05 |
| 7948675 | Surface-corrected multilayer-film mirrors with protected reflective surfaces, exposure systems comprising same, and associated methods | — | 2011-05-24 |
| 7812928 | Exposure apparatus | — | 2010-10-12 |
| 7706058 | Multilayer mirror, method for manufacturing the same, and exposure equipment | Noriaki Kandaka, Katsuhiko Murakami, Takaharu Komiya | 2010-04-27 |
| 7599112 | Multilayer-film mirrors, lithography systems comprising same, and methods for manufacturing same | — | 2009-10-06 |
| 7491955 | EUV light source, EUV exposure system, and production method for semiconductor device | — | 2009-02-17 |
| 7440182 | Multilayer mirror, method for manufacturing the same, and exposure equipment | Noriaki Kandaka, Katsuhiko Murakami, Takaharu Komiya | 2008-10-21 |
| 7382527 | EUV multilayer mirror with phase shifting layer | Noriaki Kandaka, Katsuhiko Murakami, Takaharu Komiya | 2008-06-03 |
| 7203275 | Multilayer film reflector and X-ray exposure system | — | 2007-04-10 |
| 7145987 | X-ray-generating devices and exposure apparatus comprising same | — | 2006-12-05 |
| 6843572 | Form-error-cancelling mirror-support devices and related methods, and microlithography systems comprising same | — | 2005-01-18 |
| 6833223 | Multilayer-film reflective mirrors and optical systems comprising same | — | 2004-12-21 |
| 6728037 | Multilayer-coated reflective mirrors for X-ray optical systems, and methods for producing same | — | 2004-04-27 |
| 6507641 | X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same | Hiroyuki Kondo, Katsuhiko Murakami, Katsumi Sugisaki | 2003-01-14 |
| 6504900 | Optical sample X-ray testing apparatus and method for testing optical sample with X-rays | Hiroyuki Kondo | 2003-01-07 |