Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11914289 | Method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic mask | Joachim Welte, Uri Stern, Kujan Gorhad | 2024-02-27 |
| 11366382 | Method and apparatus for performing an aerial image simulation of a photolithographic mask | Joachim Welte, Bernd Geh, Paul Graeupner, Anja Schauer | 2022-06-21 |
| 11366383 | Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask | Kujan Gorhad, Joachim Welte, Tanya Serzhanyuk | 2022-06-21 |
| 11249294 | Optical system and method for correcting mask defects using the system | Markus Seesselberg, Joachim Welte, Uri Stern, Tomer Cohen, Erez Graitzer | 2022-02-15 |
| 10578975 | Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography | Thomas Thaler, Joachim Welte, Kujan Gorhad, Ute Buttgereit, Thomas Scheruebl +1 more | 2020-03-03 |
| 10353295 | Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer | Bernd Geh | 2019-07-16 |
| 10114294 | Apparatus and method for imparting direction-selective light attenuation | — | 2018-10-30 |
| 10061192 | Method and apparatus for correcting errors on a wafer processed by a photolithographic mask | Dirk Beyer, Ofir Sharoni, Nadav Wertsman | 2018-08-28 |
| 9798249 | Method and apparatus for compensating at least one defect of an optical system | Ingo Saenger, Frank Schlesener, Markus Mengel, Johannes Ruoff | 2017-10-24 |
| 9753366 | Method and apparatus for the determination of laser correcting tool parameters | — | 2017-09-05 |
| 9658527 | Correction of errors of a photolithographic mask using a joint optimization process | — | 2017-05-23 |
| 9606444 | Method and apparatus for locally deforming an optical element for photolithography | Uri Stern | 2017-03-28 |
| 9436080 | Method and apparatus for correcting errors on a wafer processed by a photolithographic mask | Dirk Beyer, Ofir Sharoni, Nadav Wertsman | 2016-09-06 |
| 9207530 | Analyses of measurement data | Ofir Sharoni, Erez Graitzer, Igor Varvaruk, Guy Ben-Zvi | 2015-12-08 |
| 9134112 | Critical dimension uniformity correction by scanner signature control | Ofir Sharoni, Eran Chason, Guy Ben-Zvi, Igor Varvaruk | 2015-09-15 |
| 9034539 | Controllable transmission and phase compensation of transparent material | Sergey Oshemkov, Ralph Klaesges, Markus Mengel, Vladimir Kruglyakov, Eitan Zait +2 more | 2015-05-19 |
| 8871409 | Lithographic targets for uniformity control | Rainer Pforr, Guy Ben-Zvi, Erez Graitzer | 2014-10-28 |
| 8869076 | Global landmark method for critical dimension uniformity reconstruction | Ofir Sharoni | 2014-10-21 |
| 8592770 | Method and apparatus for DUV transmission mapping | Guy Ben-Zvi, Eitan Zait, Steven Labovitz, Erez Graitzer, Ofir Sharoni | 2013-11-26 |
| 8421026 | Method and apparatus for mapping of line-width size distributions on photomasks | Guy Ben-Zvi, Eitan Zait, Erez Graitzer | 2013-04-16 |
| 7459242 | Method and system for repairing defected photomasks | Eitan Zait, Sergey Oshemkov, Nikolay N. Guletskiy, Guy Ben-Zvi | 2008-12-02 |