| 12094707 |
Plasma enhanced CVD with periodic high voltage bias |
Kelvin Chan, Simon Huang, Philip Allan Kraus |
2024-09-17 |
| 11728124 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more |
2023-08-15 |
| 11069504 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more |
2021-07-20 |
| 10923320 |
System for tunable workpiece biasing in a plasma reactor |
Philip Allan Kraus, Leonid Dorf, Prabu Gopalraja |
2021-02-16 |
| 10904996 |
Substrate support with electrically floating power supply |
Haitao Wang, Philip Allan Kraus, Vijay D. Parkhe, Daniel Distaso, Christopher A. Rowland +2 more |
2021-01-26 |
| 10840086 |
Plasma enhanced CVD with periodic high voltage bias |
Kelvin Chan, Simon Huang, Philip Allan Kraus |
2020-11-17 |
| 10714372 |
System for coupling a voltage to portions of a substrate |
Thai Cheng Chua, Philip Allan Kraus, Christian Amormino, Jaeyong Cho |
2020-07-14 |
| 10685807 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more |
2020-06-16 |
| 10373804 |
System for tunable workpiece biasing in a plasma reactor |
Philip Allan Kraus, Leonid Dorf, Prabu Gopalraja |
2019-08-06 |
| 10312048 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more |
2019-06-04 |
| 10249479 |
Magnet configurations for radial uniformity tuning of ICP plasmas |
Joseph AuBuchon, Tza-Jing Gung, Nattaworn Boss Nunta, Sheng-Chin Kung, Steven Lane +2 more |
2019-04-02 |
| 10115566 |
Method and apparatus for controlling a magnetic field in a plasma chamber |
Steven Lane, Tza-Jing Gung, Kartik Ramaswamy, Joseph AuBuchon, Yang Yang |
2018-10-30 |
| 9659751 |
System and method for selective coil excitation in inductively coupled plasma processing reactors |
Kartik Ramaswamy, Yang Yang, Steven Lane, Lawrence Wong, Joseph AuBuchon |
2017-05-23 |
| 9613783 |
Method and apparatus for controlling a magnetic field in a plasma chamber |
Steven Lane, Tza-Jing Gung, Kartik Ramaswamy, Joseph AuBuchon, Yang Yang |
2017-04-04 |
