Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12068152 | Semiconductor substrate bevel cleaning | — | 2024-08-20 |
| 11887819 | Systems for cooling RF heated chamber components | Jon McChesney, Richard A. Marsh, Alexander Paterson, John Holland | 2024-01-30 |
| 11704463 | Method of etch model calibration using optical scatterometry | Ye Feng, Marcus Musselman, Andrew D. Bailey, III, Mehmet Derya Tetiker, Yan Zhang +1 more | 2023-07-18 |
| 11692732 | Air cooled faraday shield and methods for using the same | John Drewery, Jon McChesney, Alex Paterson | 2023-07-04 |
| 11624981 | Resist and etch modeling | David M. Fried | 2023-04-11 |
| 11538666 | Multi-zone cooling of plasma heated window | Yiting Zhang, Richard A. Marsh, Alexander Paterson | 2022-12-27 |
| 11495441 | Systems for cooling RF heated chamber components | Jon McChesney, Richard A. Marsh, Alexander Paterson, John Holland | 2022-11-08 |
| 11424103 | Control of on-wafer cd uniformity with movable edge ring and gas injection adjustment | Yiting Zhang, Alex Paterson | 2022-08-23 |
| 11171021 | Internal plasma grid for semiconductor fabrication | Harmeet Singh, Thorsten Lill, Alex Paterson, Richard A. Marsh | 2021-11-09 |
| 10997345 | Method of etch model calibration using optical scatterometry | Ye Feng, Marcus Musselman, Andrew D. Bailey, III, Mehmet Derya Tetiker, Yan Zhang +1 more | 2021-05-04 |
| 10825661 | Systems for cooling RF heated chamber components | Jon McChesney, Richard A. Marsh, Alexander Paterson, John Holland | 2020-11-03 |
| 10690374 | Air cooled faraday shield and methods for using the same | John Drewery, Jon McChesney, Alex Paterson | 2020-06-23 |
| 10585347 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Richard Wise, Harmeet Singh, Alex Paterson, Andrew D. Bailey, III, Vahid Vahedi +1 more | 2020-03-10 |
| 10572697 | Method of etch model calibration using optical scatterometry | Ye Feng, Marcus Musselman, Andrew D. Bailey, III, Mehmet Derya Tetiker, Yan Zhang +1 more | 2020-02-25 |
| 10534257 | Layout pattern proximity correction through edge placement error prediction | Mehmet Derya Tetiker, Andrew D. Bailey, III, Richard Wise | 2020-01-14 |
| 10460951 | Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity | Monica Titus, Alex Paterson | 2019-10-29 |
| 10410832 | Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment | Yiting Zhang, Alex Paterson | 2019-09-10 |
| 10386828 | Methods and apparatuses for etch profile matching by surface kinetic model optimization | Mehmet Derya Tetiker, Andrew D. Bailey, III, Juline Shoeb, Alex Paterson, Richard A. Gottscho | 2019-08-20 |
| 10303830 | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization | Mehmet Derya Tetiker, Andrew D. Bailey, III, Alex Paterson, Richard A. Gottscho | 2019-05-28 |
| 10262867 | Fast-gas switching for etching | Alexander Paterson | 2019-04-16 |
| 10254641 | Layout pattern proximity correction through fast edge placement error prediction | Julien Mailfert, Mehmet Derya Tetiker | 2019-04-09 |
| 10249511 | Ceramic showerhead including central gas injector for tunable convective-diffusive gas flow in semiconductor substrate processing apparatus | Alexander Paterson | 2019-04-02 |
| 10242845 | Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber | Zhongkui Tan, Yiting Zhang, Qian Fu, Qing Xu, Ying Wu +1 more | 2019-03-26 |
| 10197908 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Richard Wise, Harmeet Singh, Alex Paterson, Andrew D. Bailey, III, Vahid Vahedi +1 more | 2019-02-05 |
| 10163610 | Extreme edge sheath and wafer profile tuning through edge-localized ion trajectory control and plasma operation | Tom A. Kamp, Alexander Paterson | 2018-12-25 |