Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7565879 | Plasma processing apparatus | Kazue Takahashi, Kouichi Okamura, Ryoji Hamasaki, Satoshi Ito | 2009-07-28 |
| 7208422 | Plasma processing method | Kazue Takahashi, Kouichi Okamura, Ryoji Hamasaki, Satoshi Ito | 2007-04-24 |
| 6846363 | Plasma processing apparatus and method | Hideyuki Kazumi, Tsutomu Tetsuka, Ryoji Nishio, Masatsugu Arai, Ken Yoshioka +4 more | 2005-01-25 |
| 6833051 | Plasma processing apparatus and method | Hideyuki Kazumi, Tsutomu Tetsuka, Ryoji Nishio, Masatsugu Arai, Ken Yoshioka +4 more | 2004-12-21 |
| 6815365 | Plasma etching apparatus and plasma etching method | Toshio Masuda, Kazue Takahashi, Mitsuru Suehiro, Tetsunori Kaji | 2004-11-09 |
| 6583979 | Electrostatically attracting electrode and a method of manufacture thereof | Kazue Takahasi, Youichi Itou, Seiichiro Kanno | 2003-06-24 |
| 6549393 | Semiconductor wafer processing apparatus and method | Seiichiro Kanno, Hironobu Kawahara, Mitsuru Suehiro, Ken Yoshioka | 2003-04-15 |
| 6499424 | Plasma processing apparatus and method | Hideyuki Kazumi, Tsutomu Tetsuka, Ryoji Nishio, Masatsugu Arai, Ken Yoshioka +4 more | 2002-12-31 |
| 6482747 | Plasma treatment method and plasma treatment apparatus | Kazue Takahashi, Yoshiaki Satou, Takazumi Ishizu | 2002-11-19 |
| 6481370 | Plasma processsing apparatus | Hideyuki Kazumi, Tsutomu Tetsuka, Ryoji Nishio, Masatsugu Arai, Ken Yoshioka +4 more | 2002-11-19 |
| 6373681 | Electrostatic chuck, and method of and apparatus for processing sample using the chuck | Seiichiro Kanno, Tatehito Usui, Ken Yoshioka, Youichi Itou | 2002-04-16 |
| 6370007 | Electrostatic chuck | Kazue Takahasi, Youichi Itou, Seiichiro Kanno | 2002-04-09 |
| 6245202 | Plasma treatment device | Manabu Edamura, Ryoji Nishio, Ken Yoshioka | 2001-06-12 |
| 6243251 | Electrostatic chuck, and method of and apparatus for processing sample using the chuck | Seiichiro Kanno, Tatehito Usui, Ken Yoshioka, Youichi Itou | 2001-06-05 |
| 6235146 | Vacuum treatment system and its stage | Masanori Kadotani, Youichi Itou, Takashi Fujii, Hironobu Kawahara, Ryouji Hamasaki +2 more | 2001-05-22 |
| 6180019 | Plasma processing apparatus and method | Hideyuki Kazumi, Tsutomu Tetsuka, Ryoji Nishio, Masatsugu Arai, Ken Yoshioka +4 more | 2001-01-30 |
| 6171438 | Plasma processing apparatus and plasma processing method | Toshio Masuda, Kazue Takahashi, Mitsuru Suehiro, Tetsunori Kaji | 2001-01-09 |
| 6156663 | Method and apparatus for plasma processing | Katsuya Watanabe, Ryoji Hamasaki, Tsuyoshi Yoshida, Yutaka Omoto, Masayuki Kojima +3 more | 2000-12-05 |
| 5946184 | Electrostatic chuck, and method of and apparatus for processing sample | Seiichiro Kanno, Tatehito Usui, Ken Yoshioka, Youichi Itou | 1999-08-31 |
| 5914051 | Microwave plasma processing method and apparatus | Yoshinao Kawasaki, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata | 1999-06-22 |
| 5895586 | Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum | Tetsunori Kaji, Satoshi Ito, Ryoji Hamasaki, Tetsuo Ono, Tatehito Usui +2 more | 1999-04-20 |
| 5874012 | Plasma processing apparatus and plasma processing method | Kazue Takahashi, Kouichi Okamura, Ryoji Hamasaki, Satoshi Ito | 1999-02-23 |
| 5804033 | Microwave plasma processing method and apparatus | Yoshinao Kawasaki, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata, Muneo Furuse +1 more | 1998-09-08 |
| 5785807 | Microwave plasma processing method and apparatus | Yoshinao Kawasaki, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata | 1998-07-28 |
| 5781400 | Electrostatically attracting electrode and a method of manufacture thereof | Kazue Takahashi, Youichi Itou, Seiichiro Kanno | 1998-07-14 |