| 12399000 |
Systems and methods for measuring intensity in a lithographic alignment apparatus |
Mohamed Swillam, Justin Kreuzer, Stephen Roux, Muhsin Eralp |
2025-08-26 |
| 11523625 |
Feed supplement bolus with active yeast |
Peter H. Franz, Marty J. Nelson, Bradley Welding Kolstad, Nathan C. Upah, David J. Muysson +1 more |
2022-12-13 |
| RE49066 |
Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus |
Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Jacobus Cornelis Gerardus Van Der Sanden, Geoffrey O'Connor, Michael Andrew Chieda +1 more |
2022-05-10 |
| 10324383 |
Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus |
Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Jacobus Cornelius Gerardus Van Der Sanden, Geoffrey O'Connor, Michael Andrew Chieda +1 more |
2019-06-18 |
| 9927965 |
Object selection system and method |
Dick Baardse, James Carrington, Timothy A. Kelker |
2018-03-27 |
| 9041903 |
Mask inspection with fourier filtering and image compare |
Harry Sewell, Eric Brian Catey |
2015-05-26 |
| 8736810 |
EUV reticle substrates with high thermal conductivity |
Ronald A. Wilklow, Michael Perry |
2014-05-27 |
| 7633599 |
Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light |
Stephen Roux, Erik Roelof Loopstra |
2009-12-15 |
| 7527816 |
Feed supplement and method |
Peter H. Franz, Martin J. Nelson |
2009-05-05 |
| 7474384 |
Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus |
Arno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Stephen Roux |
2009-01-06 |
| 7248336 |
Method and system for improving focus accuracy in a lithography system |
Justin Kreuzer, Peter L. Filosi, Christopher Mason |
2007-07-24 |
| 7119883 |
Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light |
Stephen Roux, Erik Roelof Loopstra |
2006-10-10 |
| 7053984 |
Method and systems for improving focus accuracy in a lithography system |
Justin Kreuzer, Peter L. Filosi, Christopher Mason |
2006-05-30 |
| 6859260 |
Method and system for improving focus accuracy in a lithography system |
Justin Kreuzer, Peter L. Filosi, Christopher Mason |
2005-02-22 |
| 6398373 |
Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems |
Andrew Guzman, Carlo La Fiandra, Ronald P. Sidor, Jorge Ivaldi |
2002-06-04 |
| 6199466 |
Apparatus and method for processing palletized containers |
John Richardson Crawford |
2001-03-13 |
| 5862880 |
Roof scaffolding system |
Sharon L. Niles |
1999-01-26 |
| 5559601 |
Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle |
Gregg M. Gallatin, Justin Kreuzer |
1996-09-24 |