Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6907432 | Method and system for recycling materials | Charles R. Szmanda, Peter Trefonas, III, Richard C. Hemond, Mark S. Thirsk, Anthony Zampini | 2005-06-14 |
| 6803171 | Photoimageable composition | Dana Gronbeck, George G. Barclay, Kao Xiong, Subbareddy Kanagasabapathy | 2004-10-12 |
| 6610609 | Compatibilization treatment | Edward W. Rutter, Jr. | 2003-08-26 |
| 6383712 | Polymer-bound sensitizer | Premlatha Jagannathan, Wayne M. Moreau, Randolph J. Smith | 2002-05-07 |
| 6207787 | Antireflective coating for microlithography | James T. Fahey, Brian Herbst, Wayne M. Moreau, Gary T. Spinillo, Kevin M. Welsh +1 more | 2001-03-27 |
| 6136498 | Polymer-bound sensitizer | Premlatha Jagannathan, Wayne M. Moreau, Randolph J. Smith | 2000-10-24 |
| 6074800 | Photo acid generator compounds, photo resists, and method for improving bias | Gregory Breyta, Phillip Brock, Daniel J. Dawson, Ronald A. DellaGuardia, Charlotte R. DeWan +6 more | 2000-06-13 |
| 5736301 | Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used | James T. Fahey, Brian Herbst, Wayne M. Moreau, Gary T. Spinillo, Kevin M. Welsh +1 more | 1998-04-07 |
| 5607824 | Antireflective coating for microlithography | James T. Fahey, Brian Herbst, Wayne M. Moreau, Gary T. Spinillo, Kevin M. Welsh +1 more | 1997-03-04 |
| 5561194 | Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene | Kathleen Cornett, Judy B. Dorn, Margaret C. Lawson, Wayne M. Moreau, Randolph J. Smith +1 more | 1996-10-01 |
| 5547812 | Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer | James Patrick Collins, Judy B. Dorn, James T. Fahey, William J. Miller, Wayne M. Moreau +3 more | 1996-08-20 |
| 5322765 | Dry developable photoresist compositions and method for use thereof | Nicholas J. Clecak, Willard E. Conley, Ranee W. Kwong, Scott A. MacDonald, Harbans S. Sachdev +2 more | 1994-06-21 |
| 5312717 | Residue free vertical pattern transfer with top surface imaging resists | Harbans S. Sachdev, John C. Forster, Scott A. MacDonald, K. Paul Muller, Walter E. Mlynko +1 more | 1994-05-17 |
| 5296332 | Crosslinkable aqueous developable photoresist compositions and method for use thereof | Harbans S. Sachdev, Willard E. Conley, Premlatha Jagannathan, Ahmad D. Katnani, Ranee W. Kwong +2 more | 1994-03-22 |
| 5115090 | Viscosity stable, essentially gel-free polyamic acid compositions | Krishna G. Sachdev, John P. Hummel, Ranee W. Kwong, Robert N. Lang, Harbans S. Sachdev | 1992-05-19 |