Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12351921 | Distribution body for a process fluid for chemical and/or electrolytic surface treatment of a substrate | Andreas Gleissner, Philipp Engesser | 2025-07-08 |
| 11908698 | Method and device for plating a recess in a substrate | Franz Markut, Thomas Wirnsberger, Oliver Knoll, Andreas Gleissner, Philipp Engesser | 2024-02-20 |
| 11164748 | Method and device for plating a recess in a substrate | Franz Markut, Thomas Wirnsberger, Oliver Knoll, Andreas Gleissner, Philipp Engesser | 2021-11-02 |
| 10249521 | Wet-dry integrated wafer processing system | Thorsten Lill, Andreas Fischer, Richard H. Gould, Michael Myslovaty, Philipp Engesser +1 more | 2019-04-02 |
| 9653328 | Method and apparatus for surface treatment using inorganic acid and ozone | Franz Kumning, Rainer Obweger, Thomas Wirnsberger | 2017-05-16 |
| 9472402 | Methods and structures for protecting one area while processing another area on a chip | Deok-kee Kim, Kenneth T. Settlemyer, Jr., Kangguo Cheng, Ramachandra Divakaruni, Carl Radens +4 more | 2016-10-18 |
| 9059000 | Methods and structures for protecting one area while processing another area on a chip | Deok-kee Kim, Kenneth T. Settlemyer, Jr., Kangguo Cheng, Ramachandra Divakaruni, Carl Radens +4 more | 2015-06-16 |
| 8709165 | Method and apparatus for surface treatment using inorganic acid and ozone | Franz Kumning, Rainer Obweger, Thomas Wirnsberger | 2014-04-29 |
| 8668777 | Process for treating a semiconductor wafer | Dieter Frank, Franz Kumnig | 2014-03-11 |
| 7887711 | Method for etching chemically inert metal oxides | Douglas A. Buchanan, Eduard A. Cartier, Evgeni Gousev, Katherine L. Saenger | 2011-02-15 |
| 7497959 | Methods and structures for protecting one area while processing another area on a chip | Deok-kee Kim, Kenneth T. Settlemyer, Jr., Kangguo Cheng, Ramachandra Divakaruni, Carl Radens +4 more | 2009-03-03 |
| 6958506 | High-dielectric constant insulators for feol capacitors | Evgeni Gousev, Arne Ballantine, Douglas A. Buchanan, Eduard A. Cartier, Douglas D. Coolbaugh | 2005-10-25 |
| 6667207 | High-dielectric constant insulators for FEOL capacitors | Arne Ballantine, Douglas A. Buchanan, Eduard A. Cartier, Douglas D. Coolbaugh, Evgeni Gousev | 2003-12-23 |
| 6634371 | Apparatus for removing contaminants from a workpiece using a chemically reactive additive | Richard H. Gaylord, Frederick William Kern, Jr., Donald J. Martin, John Joseph Snyder, William A. Syverson | 2003-10-21 |
| 6511873 | High-dielectric constant insulators for FEOL capacitors | Arne Ballantine, Douglas A. Buchanan, Eduard A. Cartier, Douglas D. Coolbaugh, Evgeni Gousev | 2003-01-28 |
| 6444592 | Interfacial oxidation process for high-k gate dielectric process integration | Arne Ballantine, Douglas A. Buchanan, Eduard A. Cartier, Kevin K. Chan, Matthew W. Copel +6 more | 2002-09-03 |
| 6413386 | Reactive sputtering method for forming metal-silicon layer | Alessandro C. Callegari, Eduard A. Cartier, Michael A. Gribelyuk, Theodore H. Zabel | 2002-07-02 |
| 6354309 | Process for treating a semiconductor substrate | Russell H. Arndt, Glenn W. Gale, Frederick William Kern, Jr., Karen P. Madden, George F. Ouimet +2 more | 2002-03-12 |
| 6355111 | Method for removing contaminants from a workpiece using a chemically reactive additive | Richard H. Gaylord, Frederick William Kern, Jr., Donald J. Martin, John Joseph Snyder, William A. Syverson | 2002-03-12 |
| 6276370 | Sonic cleaning with an interference signal | Emily E. Fisch, Glenn W. Gale, William A. Syverson | 2001-08-21 |
| 6254796 | Selective etching of silicate | David L. Rath, Glenn W. Gale, Rangarajan Jagannathan, Kenneth McCullough, Karen P. Madden +1 more | 2001-07-03 |
| 6200891 | Removal of dielectric oxides | Rangarajan Jagannathan, Karen P. Madden, Kenneth McCullough, Keith R. Pope, David L. Rath | 2001-03-13 |
| 6191085 | Method for cleaning semiconductor devices | Emanuel I. Cooper, Scott A. Estes, Glenn W. Gale, Rangarajan Jagannathan, David L. Rath | 2001-02-20 |
| 6173720 | Process for treating a semiconductor substrate | Russell H. Arndt, Glenn W. Gale, Frederick William Kern, Jr., Karen P. Madden, George F. Ouimet +2 more | 2001-01-16 |
| 6150282 | Selective removal of etching residues | David L. Rath, Rangarajan Jagannathan, Kenneth McCullough, Karen P. Madden, Keith R. Pope | 2000-11-21 |