Issued Patents All Time
Showing 25 most recent of 86 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261038 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Hu Kang, Shankar Swaminathan, Jun Qian, Wanki Kim, Bart J. van Schravendijk +1 more | 2025-03-25 |
| 12131909 | Selective processing with etch residue-based inhibitors | Kashish Sharma, Taeseung Kim, Samantha Tan | 2024-10-29 |
| 11823909 | Selective processing with etch residue-based inhibitors | Kashish Sharma, Taeseung Kim, Samantha Tan | 2023-11-21 |
| 11404275 | Selective deposition using hydrolysis | Paul C. Lemaire | 2022-08-02 |
| 11209729 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Adrien LaVoie, Thomas Knisley +3 more | 2021-12-28 |
| 11133180 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Hu Kang, Shankar Swaminathan, Jun Qian, Wanki Kim, Bart J. van Schravendijk +1 more | 2021-09-28 |
| 11107683 | Selective growth of metal-containing hardmask thin films | David Charles Smith, Jon Henri, Paul C. Lemaire | 2021-08-31 |
| 10998187 | Selective deposition with atomic layer etch reset | Kapu Sirish Reddy, Meliha Gozde Rainville, Nagraj Shankar, David Charles Smith, Karthik Sivaramakrishnan +1 more | 2021-05-04 |
| 10903071 | Selective deposition of silicon oxide | David Charles Smith | 2021-01-26 |
| 10843618 | Conformality modulation of metal oxide films using chemical inhibition | David Charles Smith | 2020-11-24 |
| 10831096 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Adrien LaVoie, Thomas Knisley +3 more | 2020-11-10 |
| 10825679 | Selective growth of SIO2 on dielectric surfaces in the presence of copper | Alexander R. Fox, Colleen Lawlor | 2020-11-03 |
| 10804144 | Deposition of aluminum oxide etch stop layers | Meliha Gozde Rainville, Nagraj Shankar, Kapu Sirish Reddy | 2020-10-13 |
| 10804099 | Selective inhibition in atomic layer deposition of silicon-containing films | Jon Henri, Bart J. van Schravendijk, Shane Tang, Karl Leeser | 2020-10-13 |
| 10777407 | Selective deposition of silicon nitride on silicon oxide using catalytic control | David Charles Smith | 2020-09-15 |
| 10763108 | Geometrically selective deposition of a dielectric film | Alexander R. Fox, David Charles Smith, Bart J. van Schravendijk | 2020-09-01 |
| 10665501 | Deposition of Aluminum oxide etch stop layers | Meliha Gozde Rainville, Nagraj Shankar, Kapu Sirish Reddy | 2020-05-26 |
| 10662526 | Method for selective deposition using a base-catalyzed inhibitor | Alexander R. Fox, Paul C. Lemaire, David Charles Smith | 2020-05-26 |
| 10643889 | Pre-treatment method to improve selectivity in a selective deposition process | Elham Mohimi, Pengyi Zhang, Paul C. Lemaire, Kashish Sharma, Alexander R. Fox +3 more | 2020-05-05 |
| 10643846 | Selective growth of metal-containing hardmask thin films | David Charles Smith, Jon Henri, Paul C. Lemaire | 2020-05-05 |
| 10629429 | Selective deposition of silicon oxide | David Charles Smith | 2020-04-21 |
| 10559461 | Selective deposition with atomic layer etch reset | Kapu Sirish Reddy, Meliha Gozde Rainville, Nagraj Shankar, David Charles Smith, Karthik Sivaramakrishnan +1 more | 2020-02-11 |
| 10514598 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Adrien LaVoie, Thomas Knisley +3 more | 2019-12-24 |
| 10515816 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more | 2019-12-24 |
| 10490413 | Selective growth of silicon nitride | David Charles Smith | 2019-11-26 |