Issued Patents All Time
Showing 25 most recent of 365 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11978820 | Thin single-crystal silicon solar cells mounted to a structural support member and method of fabricating | Peter H. Mitchell, Mark C. Hakey, William R. Tonti, James M. Leas | 2024-05-07 |
| 10589445 | Method of cleaving a single crystal substrate parallel to its active planar surface and method of using the cleaved daughter substrate | Toshiharu Furukawa, Mark C. Hakey, Peter H. Mitchell, William P. Parker, William R. Tonti | 2020-03-17 |
| 10134631 | Size-filtered multimetal structures | Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2018-11-20 |
| 9997367 | Non-lithographic line pattern formation | Chiahsun Tseng, Chun-Chen Yeh, Yunpeng Yin | 2018-06-12 |
| 9935168 | Gate contact with vertical isolation from source-drain | Shom Ponoth, Balasubramanian Pranatharthiharan, Ruilong Xie | 2018-04-03 |
| 9660030 | Replacement gate electrode with a self-aligned dielectric spacer | Shom Ponoth, Marc A. Bergendahl, Steven J. Holmes, Charles W. Koburger, III, Chih-Chao Yang | 2017-05-23 |
| 9627377 | Self-aligned dielectric isolation for FinFET devices | Marc A. Bergendahl, Kangguo Cheng, Ali Khakifirooz, Shom Ponoth, Theodorus E. Standaert +4 more | 2017-04-18 |
| 9620619 | Borderless contact structure | Veeraraghavan S. Basker, Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2017-04-11 |
| 9614047 | Gate contact with vertical isolation from source-drain | Shom Ponoth, Balasubramanian Pranatharthiharan, Ruilong Xie | 2017-04-04 |
| 9515070 | Replacement metal gate | Effendi Leobandung, Stefan Schmitz, Junli Wang | 2016-12-06 |
| 9484254 | Size-filtered multimetal structures | Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2016-11-01 |
| 9396957 | Non-lithographic line pattern formation | Chiahsun Tseng, Chun-Chen Yeh, Yunpeng Yin | 2016-07-19 |
| 9379198 | Integrated circuit structure having selectively formed metal cap | Chih-Chao Yang, Charles W. Koburger, III, Shom Ponoth | 2016-06-28 |
| 9373580 | Dual hard mask lithography process | John C. Arnold, Sean D. Burns, Steven J. Holmes, Muthumanickam Sankarapandian, Yunpeng Yin | 2016-06-21 |
| 9368590 | Silicon-on-insulator transistor with self-aligned borderless source/drain contacts | Susan S. Fan, Balasubramanian S. Haran, Charles W. Koburger, III | 2016-06-14 |
| 9349598 | Gate contact with vertical isolation from source-drain | Shom Ponoth, Balasubramanian Pranatharthiharan, Ruilong Xie | 2016-05-24 |
| 9330962 | Non-lithographic hole pattern formation | Chiahsun Tseng, Chun-Chen Yeh, Yunpeng Yin | 2016-05-03 |
| 9332628 | Microelectronic structure including air gap | Daniel C. Edelstein, Elbert E. Huang, Satyanarayana V. Nitta, Takeshi Nogami, Shom Ponoth +1 more | 2016-05-03 |
| 9269621 | Dual damascene dual alignment interconnect scheme | Steven J. Holmes, Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2016-02-23 |
| 9269611 | Integrated circuits having gate cap protection and methods of forming the same | Daniel T. Pham, Xiuyu Cai, Bala Haran, Charan V. Surisetty, Jin-Wook Lee +1 more | 2016-02-23 |
| 9263388 | Overlay-tolerant via mask and reactive ion etch (RIE) technique | Steven J. Holmes, Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2016-02-16 |
| 9263290 | Sub-lithographic semiconductor structures with non-constant pitch | Marc A. Bergendahl, Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2016-02-16 |
| 9231080 | Replacement metal gate | Effendi Leobandung, Stefan Schmitz, Junli Wang | 2016-01-05 |
| 9202879 | Mask free protection of work function material portions in wide replacement gate electrodes | Charles W. Koburger, III, Marc A. Bergendahl, Shom Ponoth, Chih-Chao Yang | 2015-12-01 |
| 9177820 | Sub-lithographic semiconductor structures with non-constant pitch | Marc A. Bergendahl, Charles W. Koburger, III, Shom Ponoth, Chih-Chao Yang | 2015-11-03 |