Issued Patents All Time
Showing 25 most recent of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6790311 | Plasma reactor having RF power applicator and a dual-purpose window | Kenneth S. Collins, Michael R. Rice, Farahmand Askarinam, Douglas A. Buchberger, Jr. | 2004-09-14 |
| 6736931 | Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor | Kenneth S. Collins, Michael R. Rice, John Trow, Douglas A. Buchberger, Jr. | 2004-05-18 |
| 6545420 | Plasma reactor using inductive RF coupling, and processes | Kenneth S. Collins, John Trow, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +6 more | 2003-04-08 |
| 6518195 | Plasma reactor using inductive RF coupling, and processes | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more | 2003-02-11 |
| 6514376 | Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna | Kenneth S. Collins, Michael R. Rice, Eric Askarinam, Douglas A. Buchberger, Jr. | 2003-02-04 |
| 6488807 | Magnetic confinement in a plasma reactor having an RF bias electrode | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more | 2002-12-03 |
| 6454898 | Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Eric Askarinam, Gerhard Schneider +5 more | 2002-09-24 |
| 6444085 | Inductively coupled RF plasma reactor having an antenna adjacent a window electrode | Kenneth S. Collins, Michael R. Rice, John Trow, Douglas A. Buchberger, Jr. | 2002-09-03 |
| 6440866 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2002-08-27 |
| 6365063 | Plasma reactor having a dual mode RF power application | Kenneth S. Collins, Michael R. Rice, Farahmand Askarinam, Douglas A. Buchberger, Jr. | 2002-04-02 |
| 6353206 | Plasma system with a balanced source | — | 2002-03-05 |
| 6251792 | Plasma etch processes | Kenneth S. Collins, John Trow, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +7 more | 2001-06-26 |
| 6252354 | RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control | Kenneth S. Collins, Douglas A. Buchberger, Jr., John Trow, Viktor Shel | 2001-06-26 |
| 6218312 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2001-04-17 |
| 6165311 | Inductively coupled RF plasma reactor having an overhead solenoidal antenna | Kenneth S. Collins, Michael R. Rice, John Trow, Douglas A. Buchberger, Jr. | 2000-12-26 |
| 6074512 | Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Eric Askarinam, Gerhard Schneider +5 more | 2000-06-13 |
| 6074488 | Plasma chamber support having an electrically coupled collar ring | Dennis S. Grimard | 2000-06-13 |
| 6068784 | Process used in an RF coupled plasma reactor | Kenneth S. Collins, John Trow, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +6 more | 2000-05-30 |
| 6063233 | Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna | Kenneth S. Collins, Michael R. Rice, Eric Askarinam, Douglas A. Buchberger, Jr. | 2000-05-16 |
| 6043607 | Apparatus for exciting a plasma in a semiconductor wafer processing system using a complex RF waveform | — | 2000-03-28 |
| 6036877 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2000-03-14 |
| 6024826 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2000-02-15 |
| 5990017 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 1999-11-23 |
| 5872456 | Apparatus for directly measuring component values within an RF circuit | Viktor Shel | 1999-02-16 |
| 5583737 | Electrostatic chuck usable in high density plasma | Kenneth S. Collins, John Trow, Joshua Chiu-Wing Tsui, Nicolas Bright, Jeffrey Marks +2 more | 1996-12-10 |