AL

Andrew David LaForge

AB Asml Netherlands B.V.: 13 patents #348 of 3,192Top 15%
Overall (All Time): #358,649 of 4,157,543Top 9%
13
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12389519 Guiding device and associated system Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodrigues Nunes, Alexander I. Ershov, Kornelis Frits Feenstra +13 more 2025-08-12
12287455 Oxygen-loss resistant top coating for optical elements Yue Ma, Marcus Adrianus Van De Kerkhof, Qiushi Zhu, Klaus Hummler, Peter Matthew Mayer +3 more 2025-04-29
12189313 Cleaning a structure surface in an EUV chamber Chunguang Xia, Jonghoon Baek, John Tom Stewart, IV, Deniz Van Heijnsbergen, David Robert Evans +2 more 2025-01-07
11874608 Apparatus for and method of reducing contamination from source material in an EUV light source Yue Ma, Dzmitry Labetski 2024-01-16
11846887 Prolonging optical element lifetime in an EUV lithography system Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers +20 more 2023-12-19
11822252 Guiding device and associated system Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodreigues Nunes, Alexander I. Ershov, Kornelis Frits Feenstra +13 more 2023-11-21
11347154 Cleaning a structure surface in an EUV chamber Chunguang Xia, Jonghoon Baek, John Tom Stewart, IV, Deniz Van Heijnsbergen, David Robert Evans +2 more 2022-05-31
11340532 Prolonging optical element lifetime in an EUV lithography system Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers +20 more 2022-05-24
10955749 Guiding device and associated system Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodriges Nunes, Alexander I. Ershov, Kornelis Frits Feenstra +13 more 2021-03-23
10904993 Reducing the effect of plasma on an object in an extreme ultraviolet light source Robert Jay Rafac, John Tom Stewart, IV 2021-01-26
10349509 Reducing the effect of plasma on an object in an extreme ultraviolet light source Robert Jay Rafac, John Tom Stewart, IV 2019-07-09
10064261 Extreme ultraviolet light source Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel J. W. Brown, Alexander Anthony Schafgans +1 more 2018-08-28
9357625 Extreme ultraviolet light source Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel J. W. Brown, Jason Michael Arcand +2 more 2016-05-31