Issued Patents All Time
Showing 1–25 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12424410 | RF pulsing within pulsing for semiconductor RF plasma processing | Maolin Long, Yuhou Wang, Ying Wu | 2025-09-23 |
| 12283461 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Ying Wu | 2025-04-22 |
| 12193138 | Matchless plasma source for semiconductor wafer fabrication | Maolin Long, Yuhou Wang, Ricky Marsh | 2025-01-07 |
| 12068131 | Multi-level parameter and frequency pulsing with a low angular spread | Juline Shoeb, Ying Wu | 2024-08-20 |
| 12027410 | Edge ring arrangement with moveable edge rings | Haoquan Yan, Robert Griffith O'Neill, Raphael Casaes, Jon McChesney | 2024-07-02 |
| 11915912 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Ying Wu | 2024-02-27 |
| 11798785 | Systems for reverse pulsing | Maolin Long, Zhongkui Tan, Ying Wu, Qian Fu, John Drewery | 2023-10-24 |
| 11728136 | RF pulsing within pulsing for semiconductor RF plasma processing | Maolin Long, Yuhou Wang, Ying Wu | 2023-08-15 |
| 11716805 | Matchless plasma source for semiconductor wafer fabrication | Maolin Long, Yuhou Wang, Ricky Marsh | 2023-08-01 |
| 11692732 | Air cooled faraday shield and methods for using the same | Saravanapriyan Sriraman, John Drewery, Jon McChesney | 2023-07-04 |
| 11605546 | Moveable edge coupling ring for edge process control during semiconductor wafer processing | Jon McChesney | 2023-03-14 |
| 11569067 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Ying Wu | 2023-01-31 |
| 11462390 | Multi-level parameter and frequency pulsing with a low angular spread | Juline Shoeb, Ying Wu | 2022-10-04 |
| 11437219 | Frequency tuning for a matchless plasma source | Maolin Long, Yuhou Wang, Ying Wu | 2022-09-06 |
| 11424103 | Control of on-wafer cd uniformity with movable edge ring and gas injection adjustment | Yiting Zhang, Saravanapriyan Sriraman | 2022-08-23 |
| 11342159 | RF pulsing within pulsing for semiconductor RF plasma processing | Maolin Long, Yuhou Wang, Ying Wu | 2022-05-24 |
| 11224116 | Matchless plasma source for semiconductor wafer fabrication | Maolin Long, Yuhou Wang, Ricky Marsh | 2022-01-11 |
| 11171021 | Internal plasma grid for semiconductor fabrication | Harmeet Singh, Thorsten Lill, Richard A. Marsh, Saravanapriyan Sriraman | 2021-11-09 |
| 11112773 | Systems for removing and replacing consumable parts from a semiconductor process module in situ | David Trussell, Alan J. Miller, John Daugherty | 2021-09-07 |
| 11049693 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Ying Wu | 2021-06-29 |
| 10950454 | Integrated atomic layer passivation in TCP etch chamber and in-situ etch-ALP method | Xiang Zhou, Tom A. Kamp, Yoshie Kimura, Duming Zhang, Chen Xu +1 more | 2021-03-16 |
| 10784083 | RF voltage sensor incorporating multiple voltage dividers for detecting RF voltages at a pickup device of a substrate support | Maolin Long, John Drewery | 2020-09-22 |
| 10770339 | Automated replacement of consumable parts using interfacing chambers | Damon Tyrone Genetti, Jon McChesney, Derek John Witkowicki, Austin Ngo | 2020-09-08 |
| 10755896 | Multi-level pulsing of DC and RF signals | Juline Shoeb, Ying Wu | 2020-08-25 |
| 10734195 | Systems and methods for transformer coupled plasma pulsing with transformer coupled capacitive tuning switching | Maolin Long | 2020-08-04 |