JB

Justin K. Brask

IN Intel: 185 patents #73 of 30,777Top 1%
TR Tahoe Research: 1 patents #81 of 215Top 40%
📍 Portland, OR: #32 of 9,213 inventorsTop 1%
🗺 Oregon: #67 of 28,073 inventorsTop 1%
Overall (All Time): #3,899 of 4,157,543Top 1%
187
Patents All Time

Issued Patents All Time

Showing 151–175 of 187 patents

Patent #TitleCo-InventorsDate
7071064 U-gate transistors and methods of fabrication Brian S. Doyle, Surinder Singh, Uday Shah, Robert S. Chau 2006-07-04
7064066 Method for making a semiconductor device having a high-k gate dielectric and a titanium carbide gate electrode Matthew V. Metz, Suman Datta, Mark L. Doczy, Jack T. Kavalieros, Robert S. Chau 2006-06-20
7060576 Epitaxially deposited source/drain Nick Lindert, Anand S. Murthy 2006-06-13
7060568 Using different gate dielectrics with NMOS and PMOS transistors of a complementary metal oxide semiconductor integrated circuit Matthew V. Metz, Suman Datta, Jack T. Kavalieros, Mark L. Doczy, Robert S. Chau 2006-06-13
7056780 Etching metal silicides and germanides Robert Turkot 2006-06-06
7045428 Method for making a semiconductor device with a high-k gate dielectric and a conductor that facilitates current flow across a P/N junction Jack T. Kavalieros, Mark L. Doczy, Matthew V. Metz, Uday Shah, Chris Barns +3 more 2006-05-16
7037845 Selective etch process for making a semiconductor device having a high-k gate dielectric Uday Shah, Mark L. Doczy, Jack T. Kavalieros, Robert S. Chau, Robert Turkot +1 more 2006-05-02
7034399 Forming a porous dielectric layer Grant Kloster, Kevin P. O'Brien, Michael Goodner, Donald Bruner 2006-04-25
7022655 Highly polar cleans for removal of residues from semiconductor structures Robert Turkot, Vijayakumar Ramachandrarao 2006-04-04
7018938 Controlled use of photochemically susceptible chemistries for etching, cleaning and surface conditioning Subramanyam Iyer, Vijayakumar Ramachandrarao 2006-03-28
6974764 Method for making a semiconductor device having a metal gate electrode Mark L. Doczy, Jack T. Kavalieros, Uday Shah, Matthew V. Metz, Robert S. Chau +1 more 2005-12-13
6972225 integrating n-type and P-type metal gate transistors Mark L. Doczy, Steven J. Keating, Chris Barns, Brian S. Doyle, Michael L. McSwiney +2 more 2005-12-06
6953719 Integrating n-type and p-type metal gate transistors Mark L. Doczy, Steven J. Keating, Chris Barns, Brian S. Doyle, Michael L. McSwiney +2 more 2005-10-11
6946350 Controlled faceting of source/drain regions Nick Lindert 2005-09-20
6939815 Method for making a semiconductor device having a high-k gate dielectric Mark L. Doczy, Scott A. Hareland, John Barnak, Matthew V. Metz, Jack T. Kavalieros +1 more 2005-09-06
6927146 Chemical thinning of epitaxial silicon layer over buried oxide Mohamed Shaheen, Ruitao Zhang 2005-08-09
6924456 Method and apparatus for particle removal 2005-08-02
6909154 Sacrificial annealing layer for a semiconductor device and a method of fabrication Mark Liu 2005-06-21
6896774 Acoustic streaming of condensate during sputtered metal vapor deposition Mark L. Doczy, Robert Turkot 2005-05-24
6897134 Method for making a semiconductor device having a high-k gate dielectric Mark L. Doczy, John Barnak, Robert S. Chau 2005-05-24
6893927 Method for making a semiconductor device with a metal gate electrode Uday Shah, Mark L. Doczy, Jack T. Kavalieros, Matthew V. Metz, Robert S. Chau 2005-05-17
6887800 Method for making a semiconductor device with a high-k gate dielectric and metal layers that meet at a P/N junction Matthew V. Metz, Suman Datta, Jack T. Kavalieros, Mark L. Doczy, Uday Shah +1 more 2005-05-03
6869889 Etching metal carbide films Jack T. Kavalieros, Mark L. Doczy, Matthew V. Metz, Suman Datta, Uday Shah +2 more 2005-03-22
6867102 Method for making a semiconductor device having a high-k gate dielectric Mark L. Doczy, John Barnak, Ying Zhou 2005-03-15
6861005 Generating nitride waveguides 2005-03-01