Issued Patents All Time
Showing 176–187 of 187 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6858483 | Integrating n-type and p-type metal gate transistors | Mark L. Doczy, Steven J. Keating, Chris Barns, Brian S. Doyle, Michael L. McSwiney +2 more | 2005-02-22 |
| 6855639 | Precise patterning of high-K films | Mark L. Doczy, Matthew V. Metz, John Barnak, Paul Markworth | 2005-02-15 |
| 6806146 | Method for making a semiconductor device having a high-k gate dielectric | Mark L. Doczy, John Barnak, Ying Zhou | 2004-10-19 |
| 6797622 | Selective etching of polysilicon | Steven J. Keating, Mark L. Doczy, Travis J. Delashmutt | 2004-09-28 |
| 6770568 | Selective etching using sonication | — | 2004-08-03 |
| 6746967 | Etching metal using sonication | Boyan Boyanov | 2004-06-08 |
| 6743740 | Using sonic energy in connection with laser-assisted direct imprinting | — | 2004-06-01 |
| 6737365 | Forming a porous dielectric layer | Grant Kloster, Kevin P. O'Brien, Michael Goodner, Donald Bruner | 2004-05-18 |
| 6716707 | Method for making a semiconductor device having a high-k gate dielectric | Timothy E. Glassman, Mark L. Doczy, Matthew V. Metz | 2004-04-06 |
| 6709911 | Method for making a semiconductor device having a high-k gate dielectric | Mark L. Doczy, John Barnak | 2004-03-23 |
| 6696327 | Method for making a semiconductor device having a high-k gate dielectric | Mark L. Doczy, John Barnak, Robert S. Chau | 2004-02-24 |
| 6624127 | Highly polar cleans for removal of residues from semiconductor structures | Robert Turkot, Vijayakumar Ramachandrarao | 2003-09-23 |