Issued Patents All Time
Showing 51–75 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6605860 | Semiconductor structures and manufacturing methods | Alexander Michaelis, Stephan Kudelka, Uwe Schroeder, Raj Jammy, Ulrike Gruening | 2003-08-12 |
| 6605838 | Process flow for thick isolation collar with reduced length | Jack A. Mandelman, Rama Divakaruni, Gerd Fehlauer, Stephan Kudelka, Uwe Schroeder | 2003-08-12 |
| 6599798 | Method of preparing buried LOCOS collar in trench DRAMS | Stephan Kudelka, Uwe Schroeder, Rolf Weis | 2003-07-29 |
| 6579766 | Dual gate oxide process without critical resist and without N2 implant | Ravikumar Ramachandran, Kilho Lee | 2003-06-17 |
| 6573137 | Single sided buried strap | Ramachandra Divakaruni, Jack A. Mandelman, Wolfgang Bergner, Gary B. Bronner, Ulrike Gruening +5 more | 2003-06-03 |
| 6559002 | Rough oxide hard mask for DT surface area enhancement for DT DRAM | Stephan Kudelka, Stephen Rahn, Irene McStay, Uwe Schroeder | 2003-05-06 |
| 6555430 | Process flow for capacitance enhancement in a DRAM trench | Michael P. Chudzik, Johnathan E. Faltermeier, Rajarao Jammy, Stephan Kudelka, Irene McStay +1 more | 2003-04-29 |
| 6544855 | Process flow for sacrificial collar with polysilicon void | Rolf Weis, Irene McStay | 2003-04-08 |
| 6537926 | Process for improving the thickness uniformity of a thin oxide layer in semiconductor wafer fabrication | Martin Schrems | 2003-03-25 |
| 6534376 | Process flow for sacrificial collar scheme with vertical nitride mask | — | 2003-03-18 |
| 6498061 | Negative ion implant mask formation for self-aligned, sublithographic resolution patterning for single-sided vertical device formation | Rama Divakaruni, Stephan Kudelka, Irene McStay, Kil-Ho Lee, Uwe Schroeder | 2002-12-24 |
| 6486024 | Integrated circuit trench device with a dielectric collar stack, and method of forming thereof | Alexander Michaelis, Stephan Kudelka, Uwe Schroeder, Ulrike Gruening | 2002-11-26 |
| 6475859 | Plasma doping for DRAM with deep trenches and hemispherical grains | Brian Lee, Joachim Hoepfner | 2002-11-05 |
| 6458647 | Process flow for sacrificial collar with poly mask | Stephan Kudelka, Irene McStay | 2002-10-01 |
| 6451662 | Method of forming low-leakage on-chip capacitor | Michael P. Chudzik, Oleg Gluschenkov, Raj Jammy, Uwe Schroeder | 2002-09-17 |
| 6436846 | Combined preanneal/oxidation step using rapid thermal processing | Martin Schrems, Thomas Gaertner | 2002-08-20 |
| 6437401 | Structure and method for improved isolation in trench storage cells | Jack A. Mandelman, Stephan Kudelka, Andreas Knorr, Stephen Rahn, Michael Wise | 2002-08-20 |
| 6437381 | Semiconductor memory device with reduced orientation-dependent oxidation in trench structures | Ulrike Gruening, Rajarao Jammy | 2002-08-20 |
| 6426253 | Method of forming a vertically oriented device in an integrated circuit | Alexander Michaelis, Brian Lee, Uwe Schroeder, Stephan Kudelka | 2002-07-30 |
| 6406970 | Buried strap formation without TTO deposition | Stephan Kudelka | 2002-06-18 |
| 6396081 | Light source for generating a visible light | Robert Averbeck, Henning Riechert | 2002-05-28 |
| 6372567 | Control of oxide thickness in vertical transistor structures | Brian Lee, Ulrike Gruening | 2002-04-16 |
| 6362040 | Reduction of orientation dependent oxidation for vertical sidewalls of semiconductor substrates | Brian Lee, Ulrike Gruening, Raj Jammy, John Faltermeier | 2002-03-26 |
| 6358867 | Orientation independent oxidation of silicon | Jonathan E. Faltermeir, Rajeev Malik, Carol J. Heenan, Oleg Gluschenkov | 2002-03-19 |
| 6348388 | Process for fabricating a uniform gate oxide of a vertical transistor | Johnathan E. Faltermeier, Ulrike Gruening, Suryanarayan G. Hegde, Rajarao Jammy, Brian Lee | 2002-02-19 |