Issued Patents All Time
Showing 26–50 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7745875 | Method for producing a vertical field effect transistor | — | 2010-06-29 |
| 7635908 | Corresponding capacitor arrangement and method for making the same | Hans-Joachim Barth | 2009-12-22 |
| 7528453 | Field effect transistor with local source/drain insulation and associated method of production | Jürgen Holz, Klaus Schrüfer | 2009-05-05 |
| 7462901 | Field effect transistor | — | 2008-12-09 |
| 7405127 | Method for producing a vertical field effect transistor | — | 2008-07-29 |
| 7318993 | Resistless lithography method for fabricating fine structures | Rodger Fehlhaber | 2008-01-15 |
| 7169677 | Method for producing a spacer structure | — | 2007-01-30 |
| 7157329 | Trench capacitor with buried strap | Jochen Beintner, Stephan Kudelka | 2007-01-02 |
| 7157328 | Selective etching to increase trench surface area | Stephan Kudelka, Kenneth T. Settlemyer, Jr. | 2007-01-02 |
| 7129152 | Method for fabricating a short channel field-effect transistor | Rodger Fehlhaber | 2006-10-31 |
| 6967147 | Nitrogen implantation using a shadow effect to control gate oxide thickness in DRAM semiconductor | Jochen Beintner | 2005-11-22 |
| 6960541 | Process for fabrication of a semiconductor component having a tungsten oxide layer | Dirk Drescher, Martin Schrems, Helmut Wurzer | 2005-11-01 |
| 6905944 | Sacrificial collar method for improved deep trench processing | Michael P. Chudzik, Irene McStay, Porshia Wrschka | 2005-06-14 |
| 6853025 | Trench capacitor with buried strap | Jochen Beintner, Stephan Kudelka | 2005-02-08 |
| 6838334 | Method of fabricating a buried collar | Oleg Gluschenkov, Chung-Yung Sung | 2005-01-04 |
| 6797636 | Process of fabricating DRAM cells with collar isolation layers | Rolf Weis | 2004-09-28 |
| 6740555 | Semiconductor structures and manufacturing methods | Alexander Michaelis, Stephan Kudelka, Uwe Schroeder, Raj Jammy, Ulrike Gruening | 2004-05-25 |
| 6740595 | Etch process for recessing polysilicon in trench structures | Stephan Kudelka, Alexander Michaelis, Uwe Schroeder, Martin Popp, Kristin Schupke +1 more | 2004-05-25 |
| 6727142 | Orientation independent oxidation of nitrided silicon | Oleg Gluschenkov, Suryanarayan G. Hegde | 2004-04-27 |
| 6723611 | Vertical hard mask | Hiroyuki Akatsu, Oleg Gluschenkov, Porshia S. Parkinson, Ravikumar Ramachandran, Kenneth T. Settlemyer, Jr. | 2004-04-20 |
| 6677197 | High aspect ratio PBL SiN barrier formation | Stephan Kudelka | 2004-01-13 |
| 6670235 | Process flow for two-step collar in DRAM preparation | Stephan Kudelka, Oliver Genz | 2003-12-30 |
| 6656798 | Gate processing method with reduced gate oxide corner and edge thinning | Oleg Gluschenkov, Mary E. Weybright | 2003-12-02 |
| 6620724 | Low resistivity deep trench fill for DRAM and EDRAM applications | Uwe Schroeder, Irene McStay, Manfred Hauf, Matthias Goldbach, Bernhard Sell +5 more | 2003-09-16 |
| 6613642 | Method for surface roughness enhancement in semiconductor capacitor manufacturing | Stephen Rahn, Irene McStay, Uwe Schroeder, Stephan Kudelka, Rajarao Jammy | 2003-09-02 |