Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8835318 | HNO3 single wafer clean process to strip nickel and for MOL post etch | Clemens Fitz, Jochen Willi. Poth | 2014-09-16 |
| 8835298 | NiSi rework procedure to remove platinum residuals | Sivakumar KUMARASAMY, Clemens Fitz, Markus Lenski, Jochen Willi. Poth | 2014-09-16 |
| 7863149 | Method for fabricating a capacitor | Srivatsa Kundalgurki, Peter Moll, Dirk Manger, Till Schloesser | 2011-01-04 |
| 7615444 | Method for forming a capacitor structure | Odo Wunnicke, Peter Moll | 2009-11-10 |
| 7479461 | Method of etching silicon anisotropically | Teng-Wang Huang | 2009-01-20 |
| 7078748 | Multi-layer gate stack structure comprising a metal layer for a FET device, and method for fabricating the same | Matthias Goldbach, Frank Jakubowski, Ralf Koepe, Chao-Wen Lay, Michael J. Schmidt +1 more | 2006-07-18 |
| 7018781 | Method for fabricating a contact hole plane in a memory module | Hans-Georg Fröhlich, Oliver Genz, Werner Graf, Stefan Gruss, Matthias Handke +6 more | 2006-03-28 |
| 7005723 | Bipolar transistor and method of producing same | Armin Tilke | 2006-02-28 |
| 6821863 | Method for producing a cavity in a monocrystalline silicon substrate and a semiconductor component having a cavity in a monocrystalline silicon substrate with an epitaxial covering layer | Martin Popp, Dietmar Temmler, Uwe Schilling, Kerstin Pomplun | 2004-11-23 |
| 6740595 | Etch process for recessing polysilicon in trench structures | Stephan Kudelka, Helmut Tews, Alexander Michaelis, Uwe Schroeder, Martin Popp +1 more | 2004-05-25 |
| 6734077 | Method for fabricating a trench capacitor for a semiconductor memory | Matthias Forster, Anja Morgenschweis, Anett Moll, Jens-Uwe Sachse | 2004-05-11 |